Carl Zeiss

Vector recreation of the Zeiss logo as around 1975

Zeiss is a German Manufactuer of Electron Microscopes, much like Siemens it was involved in the invention of the Electron Microsocpe. Originally its development focused on the creation of Electrostatic microscopes, but this approch was later abbandoned in favor of the Electromagnetic lens.

Zeiss Started developing electron microscopes together with AEG, under the engineering leadership of Ernst Brüche, focusing on the creation of Electrostatic Electron Microscopes. This aproch was later abandoned in favor of purely magnetic machines with the EM9, which also marked the departure from the cooperation with AEG. AEG-Zeiss where the first company to introduce the newly invented Stigmator by Otto Rang, first featured in the EM8. This new development allowed much higher resolutions then achieved before, and is now a standard part of every electron microscope. Zeiss later introduced the first commercial in column Energy filtered TEM with the EM902, featuring a Template:Electron Energy Loss Spectroscopy, then continuing this development with purely magnetic in column filters with the OMEGA, Corrected OMEGA and MANDOLINE Filters. Development and production of TEM's ceased in In January 2013.

Zeiss produced and continues to produce SEM as well, where they introduced the Electrostatic Electromagnetic GEMINI Column with the DSM982. Further more Zeiss produces optics, light microscopes, and much much more. (add more later)

The EM9 marked the first all Electromagnetic Electron Microscope constructed by Carl Zeiss.

List of Models

Transmition Electron Microscopes

Early Models

EM6
	General Year Successor EM7 Magnification Range Magnification Gauge Type Specemin Chamber Pressure Power Consumption System Weight	Electrion Source Accelerator Type Cathode Type Accelerating Voltage Stability Cathode Heating Methode Alignment Methode	Condensor Number of Condensor Lenses Stability Stigmator Minimum Spot Size Diameter Condensor Alignment Lens Type Electrostatic	Stage Holder Type X, Y Travel Range	Objective Lens Focal Length Adjustment Range Spherical Error Stability Stigmator Alignment Aids Point Resolution Å Lens Type Electrostatic	Projective Lens Number of Projective Lens Stability Polpeace Configuration Avalible Polpeace Magnification(s) Alignment Lens Type Electrostatic

EM7
200px	General Year 1945 Successor EM8 Magnification Range Magnification Gauge Type Specemin Chamber Pressure Power Consumption System Weight	Electrion Source Accelerator Type Cathode Type Accelerating Voltage 100KV Stability Cathode Heating Methode Alignment Methode	Condensor Number of Condensor Lenses Stability Stigmator Minimum Spot Size Diameter Condensor Alignment Lens Type Electrostatic	Stage Holder Type X, Y Travel Range	Objective Lens Focal Length Adjustment Range Spherical Error Stability Stigmator Alignment Aids Point Resolution 100 -200 nm Å Lens Type Electrostatic	Projective Lens Number of Projective Lens Stability Polpeace Configuration Avalible Polpeace Magnification(s) Alignment Lens Type Electrostatic

EM8
	General Year Successor EM9 Magnification Range Magnification Gauge Type Specemin Chamber Pressure Power Consumption System Weight	Electrion Source Accelerator Type Cathode Type Accelerating Voltage Stability Cathode Heating Methode Alignment Methode	Condensor Number of Condensor Lenses Stability Stigmator Minimum Spot Size Diameter Condensor Alignment Lens Type Electrostatic	Stage Holder Type X, Y Travel Range	Objective Lens Focal Length Adjustment Range Spherical Error Stability Stigmator Alignment Aids Point Resolution Å Lens Type Electrostatic	Projective Lens Number of Projective Lens 2 Stability Polpeace Configuration Avalible Polpeace Magnification(s) Alignment Lens Type Electrostatic

EM9
	General Year Successor EM10 Magnification Range Magnification Gauge Type Specemin Chamber Pressure Power Consumption System Weight	Electrion Source Accelerator Type Cathode Type Accelerating Voltage Stability Cathode Heating Methode Alignment Methode	Condensor Number of Condensor Lenses Stability Stigmator Minimum Spot Size Diameter Condensor Alignment Lens Type	Stage Holder Type X, Y Travel Range	Objective Lens Focal Length Adjustment Range Spherical Error Stability Stigmator Alignment Aids Point Resolution Å Lens Type Electromagnetic	Projective Lens Number of Projective Lens Stability Polpeace Configuration Avalible Polpeace Magnification(s) Alignment Lens Type

EM7

Specs

General

Electron Source

Objective

Projective Lens

General
Year	1947
Successor	EM8
Mag. Range	1500x, 5000x, 15000x

Electron Source
Acellerating Voltage	60 KV (50 KV)

Objective
Lens Type	Electrostatic
Resolution	20Å

Projective Lens
Lens Type	Electrostatic
No. of Lenses	2

EM8

Specs

General

Electron Source

Objective

Projective Lens

General
Year	1948
Successor	EM9
Mag. Range	900x, 1.6Kx, 3Kx, 5Kx, 9Kx, 16Kx

Electron Source
Accelerator Type	Steigerwald remote focus Triode
Acellerating Voltage	60 KV
Cathode	Tungsten Hairpin

Objective
Lens Type	Electrostatic
Stigmator	Electrostatic Hexapol
Resolution	7-9Å

Projective Lens
Lens Type	Electrostatic
No. of Lenses	3

EM9

Specs

General

Electron Source

Condenser

Stage

Objective

Projective Lens

General
Successor	EM10
Mag. Range	1800x, 8000x, 26Kx, 60Kx, 0-60Kx
Mag. Gauge	Text and Bulb
Power Requirment	1.8 KVA
System Weight	1320 lbs

Electron Source
Accelerator Type	Self Biased Triode
Acellerating Voltage	60 KV
Cathode	Tungsten Hairpin

Condenser
Lens Type	Electromagnetic
Nu. of Lenses	1

Stage
Holder Type	Side Entry

Objective
Lens Type	Electromagnetic
Focal Length	4mm
Stigmator	Electrostatic Octopol
Resolution	7-9Å

Projective Lens
Lens Type	Electromagnetic
No. of Lenses	2
Configuration	Single Polpiece

Orange Column Models

It should be noted that this list is far from complete, and many models are yet missing within!

EM10

Specs

General

Electron Source

Condenser

Stage

Objective

Projective Lens

General
Successor	EM10A
Mag. Range	100x, 1000x - 200Kx
Mag. Gauge	7-Seg. Digital
Chamber Pressure	5*10⁻⁵ Torr
Power Requirment	3.5 KVA
System Weight	800 Kg

Electron Source
Accelerator Type	Self Biased Triode
Acellerating Voltage	20, 40, 60, 80, 100 KV
Stability	2*10⁻⁶min
Cathode	Tungsten Hairpin
Cathode Heating	DC

Condenser
Lens Type	Electromagnetic
Nu. of Lenses	2
Stability	5*10⁻⁶/min
Stigmator	Quadropol
Spot Size	1 µm

Stage
Holder Type	Cartridge, Top Entery

Objective
Lens Type	Electromagnetic
Focal Length	2.6mm
Stability	2*10⁻⁶/min
Stigmator	Octopol
Spherical Error	2.2 mm
Chromatic Error	1.7 mm
Resolution	5Å

Projective Lens
Lens Type	Electromagnetic
No. of Lenses	2
Stability	2*10⁻⁶/min
Configuration	Single Polpiece
Stigmator	Octopol

EM10A

Specs

General

Electron Source

Condenser

Stage

Objective

Projective Lens

General
Successor	EM10C
Mag. Range	100x, 1000x - 200Kx
Mag. Gauge	7-Seg. Digital
Chamber Pressure	5*10⁻⁵ Torr
Power Requirment	3.5 KVA
System Weight	800 Kg

Electron Source
Accelerator Type	Self Biased Triode
Acellerating Voltage	20, 40, 60, 80, 100 KV
Stability	2*10⁻⁶min
Cathode	Tungsten Hairpin
Cathode Heating	DC

Condenser
Lens Type	Electromagnetic
Nu. of Lenses	2
Stability	5*10⁻⁶/min
Stigmator	Quadropol
Spot Size	1 µm

Stage
Holder Type	Cartridge, Top Entery

Objective
Lens Type	Electromagnetic
Focal Length	2.6mm
Stability	2*10⁻⁶/min
Stigmator	Octopol
Spherical Error	2.2 mm
Chromatic Error	1.7 mm
Resolution	5Å

Projective Lens
Lens Type	Electromagnetic
No. of Lenses	2
Stability	2*10⁻⁶/min
Configuration	Single Polpiece
Stigmator	Octopol

EM10B

Specs

General

Electron Source

Condenser

Stage

Objective

Projective Lens

General
Successor	EM10CR
Mag. Range	100x, 1000x - 500Kx
Mag. Gauge	7-Seg. Digital
Chamber Pressure	5*10⁻⁵ Torr
Power Requirment	3.5 KVA
System Weight	800 Kg

Electron Source
Accelerator Type	Self Biased Triode
Acellerating Voltage	20, 40, 60, 80, 100 KV
Stability	2*10⁻⁶min
Cathode	Tungsten Hairpin
Cathode Heating	DC

Condenser
Lens Type	Electromagnetic
Nu. of Lenses	2
Stability	5*10⁻⁶/min
Stigmator	Quadropol
Spot Size	200 nm

Stage
Holder Type	Cartridge, Top Entery

Objective
Lens Type	Electromagnetic
Focal Length	2.6mm
Stability	2*10⁻⁶/min
Stigmator	Octopol
Spherical Error	2.2 mm
Chromatic Error	1.7 mm
Resolution	3Å

Projective Lens
Lens Type	Electromagnetic
No. of Lenses	2
Stability	2*10⁻⁶/min
Configuration	Single Polpiece
Stigmator	Octopol

EM10C/CR

Specs

General

Electron Source

Condenser

Stage

Objective

Projective Lens

General
Successor	EM10CR
Mag. Range	100x, 1000x - 500Kx
Mag. Gauge	7-Seg. Digital
Chamber Pressure	5*10⁻⁷ Torr
Power Requirment	3.5 KVA
System Weight	800 Kg

Electron Source
Accelerator Type	Self Biased Triode
Acellerating Voltage	20, 40, 60, 80, 100 KV
Stability	2*10⁻⁶min
Cathode	Tungsten Hairpin
Cathode Heating	DC

Condenser
Lens Type	Electromagnetic
Nu. of Lenses	2
Stability	5*10⁻⁶/min
Stigmator	Quadropol

Stage
Holder Type	Cartridge, Top Entery

Objective
Lens Type	Electromagnetic
Focal Length	2.6mm
Stability	2*10⁻⁶/min
Stigmator	Octopol
Spherical Error	2.2 mm
Chromatic Error	1.7 mm
Resolution	3Å

Projective Lens
Lens Type	Electromagnetic
No. of Lenses	2
Stability	2*10⁻⁶/min
Configuration	Single Polpiece
Stigmator	Octopol

EM109

Specs

General

Electron Source

Condenser

Stage

Objective

Projective Lens

General
Mag. Range	150x, 1100x, 3000x, 20Kx, 30Kx, 250Kx, 400Kx
Mag. Gauge	7-Seg. Digital
Chamber Pressure	2*10⁻⁶ Torr

Electron Source
Accelerator Type	Self Biased Triode
Acellerating Voltage	50, 80 KV
Stability	8*10⁻⁶min
Cathode	Tungsten Hairpin
Cathode Heating	DC

Condenser
Lens Type	Electromagnetic
Nu. of Lenses	2
Stability	6*10⁻⁶/min
Stigmator	Quadropol
Spot Size	3 µm

Stage
Holder Type	Cartridge, Top Entery

Objective
Lens Type	Electromagnetic
Focal Length	2.6mm
Stability	4*10⁻⁶/min
Stigmator	Octopol
Spherical Error	2.2 mm
Chromatic Error	1.7 mm
Resolution	5Å

Projective Lens
Lens Type	Electromagnetic
No. of Lenses	3
Stability	6*10⁻⁶/min
Configuration	Single Polpiece
Stigmator	Octopol

EM900

Specs

Electron Source

Condenser

Objective

Projective Lens

Electron Source
Accelerator Type	Self Biased Triode
Cathode	Tungsten Hairpin

Condenser
Lens Type	Electromagnetic

Objective
Lens Type	Electromagnetic

Projective Lens
Lens Type	Electromagnetic

EM902

Specs

Electron Source

Condenser

Objective

Projective Lens

Electron Source
Accelerator Type	Self Biased Triode
Cathode	Tungsten Hairpin

Condenser
Lens Type	Electromagnetic

Objective
Lens Type	Electromagnetic

Projective Lens
Lens Type	Electromagnetic

CEM902

Specs

Electron Source

Condenser

Objective

Projective Lens

Electron Source
Accelerator Type	Self Biased Triode
Cathode	Tungsten Hairpin

Condenser
Lens Type	Electromagnetic

Objective
Lens Type	Electromagnetic

Projective Lens
Lens Type	Electromagnetic

CEM902A

Specs

Electron Source

Condenser

Objective

Projective Lens

Electron Source
Accelerator Type	Self Biased Triode
Cathode	Tungsten Hairpin

Condenser
Lens Type	Electromagnetic

Objective
Lens Type	Electromagnetic

Projective Lens
Lens Type	Electromagnetic

EM906

Specs

Electron Source

Condenser

Objective

Projective Lens

Electron Source
Accelerator Type	Self Biased Triode
Cathode	LaB6

Condenser
Lens Type	Electromagnetic

Objective
Lens Type	Electromagnetic

Projective Lens
Lens Type	Electromagnetic

EM910

Specs

Electron Source

Condenser

Objective

Projective Lens

Electron Source
Accelerator Type	Self Biased Triode
Cathode	LaB6

Condenser
Lens Type	Electromagnetic

Objective
Lens Type	Electromagnetic

Projective Lens
Lens Type	Electromagnetic

EM912

Specs

Electron Source

Condenser

Objective

Projective Lens

Electron Source
Accelerator Type	Self Biased Triode
Cathode	LaB6

Condenser
Lens Type	Electromagnetic

Objective
Lens Type	Electromagnetic

Projective Lens
Lens Type	Electromagnetic

EM922

Specs

Electron Source

Condenser

Objective

Projective Lens

Electron Source
Accelerator Type	Self Biased Triode
Cathode	LaB6

Condenser
Lens Type	Electromagnetic

Objective
Lens Type	Electromagnetic

Projective Lens
Lens Type	Electromagnetic

Libra-120

Specs

Electron Source

Condenser

Objective

Projective Lens

Electron Source
Accelerator Type	Self Biased Triode
Cathode	LaB6/Tungsten Hairpin

Condenser
Lens Type	Electromagnetic

Objective
Lens Type	Electromagnetic

Projective Lens
Lens Type	Electromagnetic

Libra-200

Specs

Electron Source

Condenser

Objective

Projective Lens

Electron Source
Acellerating Voltage	200 KV
Cathode	Schottky Field Emission

Condenser
Lens Type	Electromagnetic

Objective
Lens Type	Electromagnetic

Projective Lens
Lens Type	Electromagnetic

Centra 100

Specs

General

Electron Source

Condenser

Objective

Projective Lens

General
Year	2007

Electron Source
Acellerating Voltage	100 KV
Cathode	Tungsten Hairpin

Condenser
Lens Type	Electromagnetic

Objective
Lens Type	Electromagnetic
Resolution	2Å

Projective Lens
Lens Type	Electromagnetic

Scanning Electron Microscope

NovaScan 30
	General Year 1974 Successor [[]] Magnification Range 7X - 150 kX Magnification Gauge Type Specemin Chamber Pressure Power Consumption 3 kVA System Weight ca. 500 kg	Electrion Source Accelerator Type Self Biased Triode Gun Cathode Type Tungsten Hairpin Accelerating Voltage 1-5 kV, 15 kV, 30 kV Stability Cathode Heating Methode Alignment Methode	Condensor Number of Condensor Lenses 2 Current Stability Stigmator Aperture Condensor Alignment Lens Type	Stage Stage Type Specimen Loading Column Swingout Sample Holder Type X, Y Travel Range 25.4mm Z Travel Range 38 mm Tilt Range -5° to +90° Rotation Range 360° Drive Mechanism Micrometer (manual)	Objective Lens Working Distance Spherical Error Current Stability Stigmator dual quadropole Deflection Type double electromagnetic Point Resolution 12.5 nm Lens Type Electromagnetic

DSM-950
	General Year 1985 Successor [[]] Magnification Range 15 x- 200 kX Magnification Gauge Type CRT legend Specemin Chamber Pressure Power Consumption 3 kVA System Weight 400 kg	Electrion Source Accelerator Type Self Biased Triode Gun Cathode Type Tungsten Hairpin Accelerating Voltage 0.5kV - 5 kV, 5 kV - 30 kV Stability Cathode Heating Methode DC Alignment Methode Electromagnetic	Condensor Number of Condensor Lenses 2 Current Stability Stigmator Aperture Condensor Alignment Lens Type	Stage Stage Type Specimen Loading Pull out Stage Sample Holder Type X, Y Travel Range 25 mm Z Travel Range 25mm Tilt Range Rotation Range 360° Drive Mechanism Knob (manual)	Objective Lens Working Distance Spherical Error Current Stability Stigmator dual quadropole Deflection Type double electromagnetic Point Resolution 5 nm, 4 nm poossible Lens Type Electromagnetic

DSM-940
	General Year Successor DSM 940A Magnification Range 15 x - 200 kx Magnification Gauge Type CRT legend Specemin Chamber Pressure Power Consumption System Weight	Electrion Source Accelerator Type Self Biased Triode Gun Cathode Type Tungsten Hairpin Accelerating Voltage 1, 2, 3, 4, 5, 10, 15, 20, 30 kV Stability Cathode Heating Methode DC Alignment Methode Electromagnetic	Condensor Number of Condensor Lenses 2 Current Stability Stigmator Aperture Condensor Alignment Lens Type	Stage Stage Type Eucentric Specimen Loading Pull out Stage Sample Holder Type X, Y Travel Range 25 mm Z Travel Range 25 mm Tilt Range -15° to +90° Rotation Range 360° Drive Mechanism Knob (manual)	Objective Lens Working Distance Spherical Error Current Stability Stigmator Double Quadrupole Deflection Type Point Resolution 5 nm Lens Type Electromagnetic

DSM-960
[[File:|200px|link=DSM-960]]	General Year Successor 960 Magnification Range Magnification Gauge Type CRT legend Specemin Chamber Pressure Power Consumption System Weight	Electrion Source Accelerator Type Self Biased Triode Gun Cathode Type Tungsten Hairpin Accelerating Voltage Stability Cathode Heating Methode DC Alignment Methode Electromagnetic	Condensor Number of Condensor Lenses 2 Current Stability Stigmator Aperture Condensor Alignment Lens Type	Stage Stage Type Specimen Loading Pull out Stage Sample Holder Type X, Y Travel Range Z Travel Range Tilt Range Rotation Range Drive Mechanism Servo Motor / Knob (manual)	Objective Lens Working Distance Spherical Error Current Stability Stigmator Double Quadrupole Deflection Type Point Resolution Lens Type Electromagnetic

DSM-940A
	General Year 1991 Successor [[]] Magnification Range Magnification Gauge Type CRT legend Specemin Chamber Pressure Power Consumption System Weight	Electrion Source Accelerator Type Self Biased Triode Gun Cathode Type Tungsten Hairpin Accelerating Voltage Stability Cathode Heating Methode DC Alignment Methode Electromagnetic	Condensor Number of Condensor Lenses 2 Current Stability Stigmator Aperture Condensor Alignment Lens Type	Stage Stage Type Specimen Loading Pull out Stage Sample Holder Type X, Y Travel Range 25 mm Z Travel Range 25mm Tilt Range Rotation Range 360° Drive Mechanism Knob (manual)	Objective Lens Working Distance Spherical Error Current Stability Stigmator dual quadropole Deflection Type double electromagnetic Point Resolution Lens Type Electromagnetic

DSM-960A
	General Year 1991 Successor [[]] Magnification Range 4 x - 300 kx Magnification Gauge Type CRT legend Specemin Chamber Pressure Power Consumption System Weight	Electrion Source Accelerator Type Self Biased Triode Gun Cathode Type Tungsten Hairpin / LaB₆ Accelerating Voltage 490 v - 5 kV, 5 kV - 30 kV Stability Cathode Heating Methode DC Alignment Methode Electromagnetic	Condensor Number of Condensor Lenses 2 Current Stability Stigmator Aperture Condensor Alignment Lens Type	Stage Stage Type Eucentric Specimen Loading Pull out Stage Sample Holder Type X, Y Travel Range 80 mm Z Travel Range 30mm Tilt Range -15° to +90° Rotation Range 360° Drive Mechanism Servo Motor / Knob (manual)	Objective Lens Working Distance Spherical Error Current Stability Stigmator dual quadropole Deflection Type double electromagnetic Point Resolution 4 nm (W) / 3.5nm (LaB₆) Lens Type Electromagnetic

DSM-962
200px	General Year Successor [[]] Magnification Range Magnification Gauge Type CRT legend Specemin Chamber Pressure Power Consumption System Weight	Electrion Source Accelerator Type Self Biased Triode Gun Cathode Type Tungsten Hairpin / LaB₆ Accelerating Voltage Stability Cathode Heating Methode DC Alignment Methode Electromagnetic	Condensor Number of Condensor Lenses 2 Current Stability Stigmator Aperture Condensor Alignment Lens Type	Stage Stage Type Eucentric Specimen Loading Pull out Stage Sample Holder Type X, Y Travel Range 80 mm Z Travel Range 30mm Tilt Range -15° to +90° Rotation Range 360° Drive Mechanism Servo Motor / Knob (manual)	Objective Lens Working Distance Spherical Error Current Stability Stigmator dual quadropole Deflection Type double electromagnetic Point Resolution Lens Type Electromagnetic

DSM-982 GEMINI
	General Year 1993 Successor LEO 982 Magnification Range up to 700 kx Magnification Gauge Type CRT legend, Plasma Display Specemin Chamber Pressure Power Consumption System Weight	Electrion Source Accelerator Type Cathode Type Schottky FEG Accelerating Voltage 200 v - 30kV Stability Cathode Heating Methode DC Alignment Methode Electromagnetic / Mechanical	Condensor Number of Condensor Lenses 1 Current Stability Stigmator Aperture Condensor Alignment Lens Type	Stage Stage Type Eucentric Specimen Loading Pull out Stage Sample Holder Type X, Y Travel Range 80 mm Z Travel Range 30mm Tilt Range -15° to +90° Rotation Range 360° Drive Mechanism Servo Motor / Knob (manual)	Objective Lens Working Distance Spherical Error Current Stability Stigmator dual quadropole Deflection Type double electromagnetic Point Resolution 1.2 mn (20kV), 2.5 nm (5kV), 4nm (1kV) Lens Type Electromagnetic

Special Projects

Project SATEM / PACEM

The SATEM (Sub Ångström Transmission Electron Mictroscope) was a Libra 200 based machine intended to achieve the highest spacial resolution achievable at the time, it featured a Image Side Spherical Aberation Corrector made by Template:CEOS, and like SESAM, it featured a Pendulum Mount. Later the machine was retrofitted to be a Phase Contrast TEM, and was renamed PACEM

Project SESAM

Project SESAM (Sub Electronvolt Sub Ångström Mictroscope) was a project running from 1996 to 2007 in which the goal was to create a Energy Filtered Electron Microscope ({Electron Energy Loss Spectroscopy | EF-TEM}) capable of having an energy resolution below 1eV while also having very high spacial resolution. (complete description later)

Three machines where built in the project, of which only 1 survived to the current day. The first being based on the EM922 (SESAM 1) and working based on a Corrected Omega Filter with a LaB6 Electron Gun. The second was the archetype for the later Libra-200 series (SESAM II) and featured the same Corrected Omega Filter as the SESAM 1, but used an Electrostatic Omega Filtered Schottky FEG. The third and final machine was the SESAM (SESAM III) featuring the newly developed MANDOLINE Filter, based on a Libra-200, and also featuring a Electrostatic Omega Filtered Schottky FEG. It also featured a Pendulum mounted column within a large frame. Of the three machines, only the SESAM (SESAM III) survived, and is currently stored at the Museum For Electron Microscopy Nuremburg (Germany), where it will soon go on display, and later be usable again.

SESAM I

SESAM I was based on a EM922, and featured a the first Corrected OMEGA Filter. It originally used a LaB6 electron gun, but was later fitted with a Electrostatic Omega monochromated Shottkey Gun. The machine was lost in a fire.

SESAM II

Archetype of the Libra 200, Originally Located at Max Plank Institute for Solid State Physics in Stuttgart Germany, where it later gave way to the SESAM III, based on anecdotes it was moved to the University Tübingen, where it was ultimately scrapped. Its Electron Gun was fitted to the SESAM I.

SESAM (SESAM III)

Originally Located in the Max Plank Institute for Solid State Physics in Stuttgart Germany, it was installed in 2007 and was in operation until 2024 where it suffered a technical defect, after which it was transferred to the Museum.

Project CRISP

Project CRISP (Corrected Illumination Scanning Probe) was a special Libra 200 based machine built in 2007, and was one of the first energy filtered monochromated abberation corrected STEM in the world, it features a Probe side abberation corrector from Template:CEOS as well as a Electrostatic Omega Filtered Shottkey FEG, and a corrected Omega In column Filter.

Project SALVE

Project SALVE (Sub Ångström Low Voltage Electron Microscope) was aimed at creating a TEM for very low voltages observations of Radiation-Sensitive materials at ultra high resolutions, at the university ULM. The project initially was based on the Libra-200 in cooperation between Zeiss and CEOS. The SALVE I was made as a feasibility study started in January 1st 2009 and lasted until December 31st 2010. Based on the original SALVE I column, SALVE II was built, featuring a new Cc/Cs Corrector from CEOS. In January 2013, Zeiss ceased production and development of TEM's and a new cooperation partner was found in FEI, where the SALVE III was then produced

Project KRONOS

Project KRONOS is a Phase contrast aberration corrected Cryo EM. (add more text later)

List of Scanning Electron Microscopes

Pre LEO Models

Model	Year
Nova Scan
DSM950
DSM940
DSM940A
DSM960
DSM962
DSM982

Documentation

Full list of all documents related to the Zeiss Electron Microscopes.

Transmission Electron Microscope

• English
  • EM10A/B
    • Manuals
      • Part A - Description
      • Part B - Operating the Aligned Instrument
      • Part C - Alignment
      • Part G - High-resolution Goniometer
      • Part M - Manipulation Cartridges
• German
  • EM8
    • Bedienungsanleitung
      • EM 8 - Kurtzanleitung
      • G 34-503-d - Elektronenmikroskop EM8 - Gebrauchsanweisung Text
      • G 34-503-d - Elektronenmikroskop EM8 - Gebrauchsanweisung Bildteil
  • EM9A
    • Manuals
      • G34-541 - Elektronenmikroskop EM9A - Bedienungsanleitung
    • Brochüre
      • 34-547-d - Elektronenmikroskop EM9A
      • 34-554-d - Elektronenmikroskop EM9S-2
  • EM10
    • Brochüre
      • 34-590-d - Hochleistungs Elektronenenmikroskop EM10 - Brochure
  • EM10A/B
    • Bedienungsanleitung
      • Teil M - Manipulations-Patronen
  • EM10C/CR
    • Bedienungsanleitung
      • Teil A - Beschreibung
      • Teil D - Wartung und Plfäge
  • EM109
    • Brochüre
      • 34-820-d - EM109 - Brochure

Scanning Electron Microscopes

• German
  • DSM940
    • DSM940 Gebrauchsanleitung
    • Split Screen Variables Raster - Bedienungsanweisung
    • 35 mm Kamera - Gebrauchsanweisung

Miscilanious

• German
  • Werkzeitschrift
    • Werkzeitschrift Nr. 42 (unvollständig)

stuff

Transmission Electron Microscops
Model	Year	Accelerating Voltage	Cathode Type	Nr. of Condensor Lenses	Nr. of Imaging Lenses	Projective	Resolution	Successor
EM7								EM8
EM8			Tungsten Hairpin	1 Electrostatic	3 Electrostatic	Imersion and EinzelLense		EM9
EM9		60 KV	Tungsten Hairpin	1 Electromagnetic	3 Electromagnetic	Single Polpiece	70 Å	[[EM10}]
EM10		20, 40, 60, 80, 100 KV		2 Electromagnetic	3 Electromagnetic	Single Polpiece	< 30 Å	EM900
EM109		50, 80 KV	Tungsten Hairpin		2 Electromagnetic	4 Electromagnetic	Single Polpiece	50 Å
EM900			Tungsten Hairpin					EM902
EM902			Tungsten Hairpin					EM912
EM906			Tungsten Hairpin			Single Polpiece
EM910			Tungsten Hairpin
EM912			Tungsten Hairpin