Vector recreation of the Zeiss logo as around 1975 Zeiss is a German Manufactuer of Electron Microscopes, much like Siemens it was involved in the invention of the Electron Microsocpe. Originally its development focused on the creation of Electrostatic microscopes, but this approch was later abbandoned in favor of the Electromagnetic lens.
Zeiss Started developing electron microscopes together with AEG, under the engineering leadership of Ernst Brüche, focusing on the creation of Electrostatic Electron Microscopes. This aproch was later abandoned in favor of purely magnetic machines with the EM9, which also marked the departure from the cooperation with AEG. AEG-Zeiss where the first company to introduce the newly invented Stigmator by Otto Rang, first featured in the EM8. This new development allowed much higher resolutions then achieved before, and is now a standard part of every electron microscope.
Zeiss later introduced the first commercial in column Energy filtered TEM with the EM902, featuring a Castaing-Henry Filter , then continuing this development with purely magnetic in column filters with the OMEGA, Corrected OMEGA and MANDOLINE Filters. Development and production of TEM's ceased in In January 2013[ 1]
Zeiss produced and continues to produce SEM as well, where they introduced the Electrostatic Electromagnetic GEMINI Column with the DSM982. Further more Zeiss produces optics, light microscopes, and much much more. (add more later)
Transmition Electron Microscopes
{{#DeviceInfoBox2:tem|EM7|Zeiss - EM8 - B. v. Bories.png|
OEM=File:Zeiss-Logo-ca-1975-recreation.png;
successor=EM8;
accel_volt=60 KV (50 KV);
objl_type=Electrostatic;
proj_type=Electrostatic;
year=1947;
objl_res=20Å;
mag_range=1500x, 5000x, 15000x;
proj_no=2;
|}}
{{#DeviceInfoBox2:tem|EM8|File:Zeiss - EM8.png|
OEM=File:Zeiss-Logo-ca-1975-recreation.png;
successor=EM9;
mag_range=900x, 1.6Kx, 3Kx, 5Kx, 9Kx, 16Kx;
accel_volt=60 KV;
accel=Steigerwald remote focus Triode;
cath_type=Tungsten Hairpin;
objl_res=7-9Å;
objl_type=Electrostatic;
objl_stig=Electrostatic Hexapol;
proj_type=Electrostatic;
proj_no=3;
year=1948;
|}}
{{#DeviceInfoBox2:tem|EM9|File:Zeiss - EM9S - Meek.png|
OEM=File:Zeiss-Logo-ca-1975-recreation.png;
mag_range=1800x, 8000x, 26Kx, 60Kx, 0-60Kx;
mag_gauge=Text and Bulb;
power=1.8 KVA;
weight=1320 lbs;
successor=EM10;
accel=Self Biased Triode;
accel_volt=60 KV;
cath_type=Tungsten Hairpin;
conl_type=Electromagnetic;
conl_no=1;
objl_foc=4mm;
objl_res=7-9Å;
objl_type=Electromagnetic;
objl_stig=Electrostatic Octopol;
proj_type=Electromagnetic;
proj_no=2;
proj_conf=Single Polpiece;
holder=Side Entry;
|}}
{{#DeviceInfoBox2:tem|EM10||
OEM=File:Zeiss-Logo-ca-1975-recreation.png;
mag_range=100x, 1000x - 200Kx;
mag_gauge=7-Seg. Digital;
power=3.5 KVA;
weight=800 Kg;
accel_stab=2*10⁻⁶min;
cath_heat=DC;
successor=EM10A;
accel=Self Biased Triode;
accel_volt=20, 40, 60, 80, 100 KV;
cath_type=Tungsten Hairpin;
conl_type=Electromagnetic;
conl_no=2;
conl_stab=5*10⁻⁶/min;
conl_stig=Quadropol;
conl_spot=1 µm;
xy=± 1 mm;
objl_foc=2.6mm;
objl_chrom=1.7 mm;
objl_spher=2.2 mm;
objl_stab=2*10⁻⁶/min;
objl_res=5Å;
objl_type=Electromagnetic;
objl_stig=Octopol;
proj_type=Electromagnetic;
proj_no=2;
proj_stab=2*10⁻⁶/min;
proj_conf=Single Polpiece;
proj_stig=Octopol;
holder=Cartridge, Top Entery;
chamber=5*10⁻⁵ Torr;
acell_current=60 µA;
|}}
{{#DeviceInfoBox2:tem|CEM902A|File:Zeiss CEM902A from Brochure.png|
OEM=File:Zeiss-Logo-ca-1975-recreation.png;
accel=Self Biased Triode;
cath_type=Tungsten Hairpin;
conl_type=Electromagnetic;
objl_type=Electromagnetic;
proj_type=Electromagnetic;
|}}
{{#DeviceInfoBox2:tem|EM906|File:LEO 906.png|
OEM=File:Zeiss-Logo-ca-1975-recreation.png;
accel=Self Biased Triode;
cath_type=LaB6;
conl_type=Electromagnetic;
objl_type=Electromagnetic;
proj_type=Electromagnetic;
|}}
{{#DeviceInfoBox2:tem|EM910|File:Zeiss_EM910.png|
OEM=File:Zeiss-Logo-ca-1975-recreation.png;
accel=Self Biased Triode;
cath_type=LaB6;
conl_type=Electromagnetic;
objl_type=Electromagnetic;
proj_type=Electromagnetic;
|}}
{{#DeviceInfoBox2:tem|EM912||
OEM=File:Zeiss-Logo-ca-1975-recreation.png;
accel=Self Biased Triode;
cath_type=LaB6;
conl_type=Electromagnetic;
objl_type=Electromagnetic;
proj_type=Electromagnetic;
|}}
{{#DeviceInfoBox2:tem|EM922||
OEM=File:Zeiss-Logo-ca-1975-recreation.png;
accel=Self Biased Triode;
cath_type=LaB6;
conl_type=Electromagnetic;
objl_type=Electromagnetic;
proj_type=Electromagnetic;
|}}
{{#DeviceInfoBox2:tem|Libra-120|File:Zeiss_Libra-120_From_Brochure.png|
OEM=File:Zeiss-Logo-ca-1975-recreation.png;
accel=Self Biased Triode;
cath_type=LaB6/Tungsten Hairpin;
conl_type=Electromagnetic;
objl_type=Electromagnetic;
proj_type=Electromagnetic;
|}}
{{#DeviceInfoBox2:tem|Libra-200|File:Zeiss_Libra-200FE_from_manual.PNG|
OEM=File:Zeiss-Logo-ca-1975-recreation.png;
cath_type=Schottky Field Emission;
conl_type=Electromagnetic;
objl_type=Electromagnetic;
proj_type=Electromagnetic;
accel_volt=200 KV;
|}}
{{#DeviceInfoBox2:tem|Centra 100||
OEM=File:Zeiss-Logo-ca-1975-recreation.png;
cath_type=Tungsten Hairpin;
conl_type=Electromagnetic;
objl_type=Electromagnetic;
proj_type=Electromagnetic;
objl_res=2Å;
accel_volt=100 KV;
year=2007;
|}}
this list is incomplete
Scanning Electron Microscope
NovaScan 30
General
Year
1974[ 2]
Successor
[[]]
Magnification Range
7X - 150 kX[ 2]
Magnification Gauge Type
Specemin Chamber Pressure
Power Consumption
3 kVA[ 2]
System Weight
ca. 500 kg[ 2]
Electrion Source
Accelerator Type
Self Biased Triode Gun
Cathode Type
Tungsten Hairpin
Accelerating Voltage
1-5 kV, 15 kV, 30 kV[ 2]
Stability
Cathode Heating Methode
Alignment Methode
Condensor
Number of Condensor Lenses
2[ 2]
Current Stability
Stigmator
Aperture
Condensor Alignment
Lens Type
Stage
Stage Type
Specimen Loading
Column Swingout
Sample Holder Type
X, Y Travel Range
25.4mm[ 2]
Z Travel Range
38 mm[ 2]
Tilt Range
-5° to +90°[ 2]
Rotation Range
360°[ 2]
Drive Mechanism
Micrometer (manual)
Objective Lens
Working Distance
Spherical Error
Current Stability
Stigmator
dual quadropole[ 2]
Deflection Type
double electromagnetic
Point Resolution
12.5 nm[ 2]
Lens Type
Electromagnetic
DSM-950
General
Year
1985[ 3]
Successor
[[]]
Magnification Range
15 x- 200 kX[ 3]
Magnification Gauge Type
CRT legend
Specemin Chamber Pressure
Power Consumption
3 kVA[ 3]
System Weight
400 kg[ 3]
Electrion Source
Accelerator Type
Self Biased Triode Gun [ 3]
Cathode Type
Tungsten Hairpin [ 3]
Accelerating Voltage
0.5kV - 5 kV, 5 kV - 30 kV[ 3]
Stability
Cathode Heating Methode
DC
Alignment Methode
Electromagnetic
Condensor
Number of Condensor Lenses
2[ 3]
Current Stability
Stigmator
Aperture
Condensor Alignment
Lens Type
Stage
Stage Type
Specimen Loading
Pull out Stage
Sample Holder Type
X, Y Travel Range
25 mm[ 3]
Z Travel Range
25mm [ 3]
Tilt Range
Rotation Range
360°[ 3]
Drive Mechanism
Knob (manual)
Objective Lens
Working Distance
Spherical Error
Current Stability
Stigmator
dual quadropole[ 3]
Deflection Type
double electromagnetic
Point Resolution
5 nm[ 3] [ 3]
Lens Type
Electromagnetic
DSM-940
General
Year
Successor
DSM 940A
Magnification Range
15 x - 200 kx[ 4]
Magnification Gauge Type
CRT legend[ 4]
Specemin Chamber Pressure
Power Consumption
System Weight
Electrion Source
Accelerator Type
Self Biased Triode Gun
Cathode Type
Tungsten Hairpin
Accelerating Voltage
1, 2, 3, 4, 5, 10, 15, 20, 30 kV[ 4]
Stability
Cathode Heating Methode
DC
Alignment Methode
Electromagnetic
Condensor
Number of Condensor Lenses
2[ 4]
Current Stability
Stigmator
Aperture
Condensor Alignment
Lens Type
Stage
Stage Type
Eucentric
Specimen Loading
Pull out Stage
Sample Holder Type
X, Y Travel Range
25 mm[ 4]
Z Travel Range
25 mm[ 4]
Tilt Range
-15° to +90°[ 4]
Rotation Range
360°[ 4]
Drive Mechanism
Knob (manual)
Objective Lens
Working Distance
Spherical Error
Current Stability
Stigmator
Double Quadrupole
Deflection Type
Point Resolution
5 nm[ 4]
Lens Type
Electromagnetic
DSM-960
[[File:|200px|link=DSM-960]]
General
Year
Successor
DSM-960A
Magnification Range
Magnification Gauge Type
CRT legend
Specemin Chamber Pressure
Power Consumption
System Weight
Electrion Source
Accelerator Type
Self Biased Triode Gun
Cathode Type
Tungsten Hairpin
Accelerating Voltage
Stability
Cathode Heating Methode
DC
Alignment Methode
Electromagnetic
Condensor
Number of Condensor Lenses
2
Current Stability
Stigmator
Aperture
Condensor Alignment
Lens Type
Stage
Stage Type
Specimen Loading
Pull out Stage
Sample Holder Type
X, Y Travel Range
Z Travel Range
Tilt Range
Rotation Range
Drive Mechanism
Servo Motor / Knob (manual)
Objective Lens
Working Distance
Spherical Error
Current Stability
Stigmator
Double Quadrupole
Deflection Type
Point Resolution
Lens Type
Electromagnetic
DSM-940A
General
Year
1991[ 5]
Successor
[[]]
Magnification Range
Magnification Gauge Type
CRT legend
Specemin Chamber Pressure
Power Consumption
System Weight
Electrion Source
Accelerator Type
Self Biased Triode Gun
Cathode Type
Tungsten Hairpin
Accelerating Voltage
Stability
Cathode Heating Methode
DC
Alignment Methode
Electromagnetic
Condensor
Number of Condensor Lenses
2
Current Stability
Stigmator
Aperture
Condensor Alignment
Lens Type
Stage
Stage Type
Specimen Loading
Pull out Stage
Sample Holder Type
X, Y Travel Range
25 mm
Z Travel Range
25mm
Tilt Range
Rotation Range
360°
Drive Mechanism
Knob (manual)
Objective Lens
Working Distance
Spherical Error
Current Stability
Stigmator
dual quadropole
Deflection Type
double electromagnetic
Point Resolution
Lens Type
Electromagnetic
DSM-960A
General
Year
1991[ 6]
Successor
[[]]
Magnification Range
4 x - 300 kx[ 6]
Magnification Gauge Type
CRT legend[ 6]
Specemin Chamber Pressure
Power Consumption
System Weight
Electrion Source
Accelerator Type
Self Biased Triode Gun
Cathode Type
Tungsten Hairpin / LaB₆[ 6]
Accelerating Voltage
490 v - 5 kV, 5 kV - 30 kV[ 6]
Stability
Cathode Heating Methode
DC
Alignment Methode
Electromagnetic
Condensor
Number of Condensor Lenses
2
Current Stability
Stigmator
Aperture
Condensor Alignment
Lens Type
Stage
Stage Type
Eucentric
Specimen Loading
Pull out Stage
Sample Holder Type
X, Y Travel Range
80 mm[ 6]
Z Travel Range
30mm[ 6]
Tilt Range
-15° to +90°[ 6]
Rotation Range
360°[ 6]
Drive Mechanism
Servo Motor / Knob (manual)
Objective Lens
Working Distance
Spherical Error
Current Stability
Stigmator
dual quadropole
Deflection Type
double electromagnetic
Point Resolution
4 nm (W) / 3.5nm (LaB₆)[ 6]
Lens Type
Electromagnetic
DSM-962
General
Year
Successor
[[]]
Magnification Range
Magnification Gauge Type
CRT legend
Specemin Chamber Pressure
Power Consumption
System Weight
Electrion Source
Accelerator Type
Self Biased Triode Gun
Cathode Type
Tungsten Hairpin / LaB₆
Accelerating Voltage
Stability
Cathode Heating Methode
DC
Alignment Methode
Electromagnetic
Condensor
Number of Condensor Lenses
2
Current Stability
Stigmator
Aperture
Condensor Alignment
Lens Type
Stage
Stage Type
Eucentric
Specimen Loading
Pull out Stage
Sample Holder Type
X, Y Travel Range
80 mm
Z Travel Range
30mm
Tilt Range
-15° to +90°
Rotation Range
360°
Drive Mechanism
Servo Motor / Knob (manual)
Objective Lens
Working Distance
Spherical Error
Current Stability
Stigmator
dual quadropole
Deflection Type
double electromagnetic
Point Resolution
Lens Type
Electromagnetic
DSM-982 GEMINI
General
Year
1993[ 7]
Successor
LEO 982
Magnification Range
up to 700 kx[ 7]
Magnification Gauge Type
CRT legend, Plasma Display
Specemin Chamber Pressure
Power Consumption
System Weight
Electrion Source
Accelerator Type
Cathode Type
Schottky FEG[ 7]
Accelerating Voltage
200 v - 30kV[ 7]
Stability
Cathode Heating Methode
DC
Alignment Methode
Electromagnetic / Mechanical
Condensor
Number of Condensor Lenses
1[ 7]
Current Stability
Stigmator
Aperture
Condensor Alignment
Lens Type
Stage
Stage Type
Eucentric
Specimen Loading
Pull out Stage[ 7]
Sample Holder Type
X, Y Travel Range
80 mm[ 7]
Z Travel Range
30mm[ 7]
Tilt Range
-15° to +90°[ 7]
Rotation Range
360°[ 7]
Drive Mechanism
Servo Motor / Knob (manual)[ 7]
Objective Lens
Working Distance
Spherical Error
Current Stability
Stigmator
dual quadropole
Deflection Type
double electromagnetic
Point Resolution
1.2 mn (20kV)[ 7] [ 7] [ 7]
Lens Type
Electromagnetic
Special Projects
The SATEM (S ub Å ngström T ransmission E lectron M ictroscope) was a Libra 200 based machine intended to achieve the highest spacial resolution achievable at the time, it featured a Image Side Spherical Aberation Corrector made by Template:CEOS , and like SESAM, it featured a Pendulum Mount. Later the machine was retrofitted to be a Phase Contrast TEM, and was renamed PACEM
Project SESAM
Main Article: Template:Zeiss SESAM
The Zeiss SESAM (SESAM III) as seen in 2020. Project SESAM (S ub E lectronvolt S ub Å ngström M ictroscope) was a project running from 1996 to 2007 in which the goal was to create a Energy Filtered Electron Microscope ({Electron Energy Loss Spectroscopy | EF-TEM}) capable of having an energy resolution below 1eV while also having very high spacial resolution. (complete description later)
Three machines where built in the project, of which only 1 survived to the current day. The first being based on the EM922 (SESAM 1) and working based on a Corrected Omega Filter with a LaB6 Electron Gun. The second was the archetype for the later Libra-200 series (SESAM II) and featured the same Corrected Omega Filter as the SESAM 1, but used an Electrostatic Omega Filtered Schottky FEG. The third and final machine was the SESAM (SESAM III) featuring the newly developed MANDOLINE Filter, based on a Libra-200, and also featuring a Electrostatic Omega Filtered Schottky FEG. It also featured a Pendulum mounted column within a large frame.
Of the three machines, only the SESAM (SESAM III) survived, and is currently stored at the Museum For Electron Microscopy Nuremburg (Germany), where it will soon go on display, and later be usable again.
SESAM I
SESAM I was based on a EM922, and featured a the first Corrected OMEGA Filter. It originally used a LaB6 electron gun, but was later fitted with a Electrostatic Omega monochromated Shottkey Gun. The machine was lost in a fire in the 2020s.
SESAM II
Archetype of the Libra 200, Originally Located at Max Plank Institute for Solid State Physics in Stuttgart Germany, where it later gave way to the SESAM III, based on anecdotes it was moved to the University Tübingen, where it was ultimately scrapped. Its Electron Gun was fitted to the SESAM I.
Originally Located in the Max Plank Institute for Solid State Physics in Stuttgart Germany, it was installed in 2007 and was in operation until 2024 where it suffered a technical defect, after which it was transferred to the Museum.
Project CRISP
Project CRISP (C orrected I llumination S canning P robe) was a special Libra 200 based machine built in 2007, and was one of the first energy filtered monochromated abberation corrected STEM in the world, it features a Probe side abberation corrector from Template:CEOS as well as a Electrostatic Omega Filtered Shottkey FEG, and a corrected Omega In column Filter.
Project SALVE
Project SALVE (S ub Å ngström L ow V oltage E lectron Microscope) was aimed at creating a TEM for very low voltages observations of Radiation-Sensitive materials at ultra high resolutions, at the university ULM. The project initially was based on the Libra-200 in cooperation between Zeiss and CEOS.
The SALVE I was made as a feasibility study [ 1] [ 1] [ 1]
Project KRONOS
Main Article: Zeiss KRONOS
Refrences
Documentation
Full list of all documents related to the Zeiss Electron Microscopes.
Transmission Electron Microscope
{{#tree:
English
German
EM8
EM9A
EM10
EM10A/B
EM10C/CR
EM109
}}
Scanning Electron Microscopes
{{#tree:
}}
Miscilanious
{{#tree:
}}
stuff
Refrences
↑ Das Elektronenmikroskop TEM+REM, Dr. Rainer Horst Lang, Dr. Jochen Blödorn, 1981, page 131
↑ Das Elektronenmikroskop TEM+REM, Dr. Rainer Horst Lang, Dr. Jochen Blödorn, 1981, page 132
↑ Das Elektronenmikroskop TEM+REM, Dr. Rainer Horst Lang, Dr. Jochen Blödorn, 1981, page 133
Part A - Description