Difference between revisions of "Carl Zeiss"

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[[File:Zeiss-Logo-ca-1975-recreation.png|thumb|Vector recreation of the Zeiss logo as around 1975]]
 
Zeiss is a German Manufactuer of Electron Microscopes, much like [[Siemens]] it was involved in the invention of the Electron Microsocpe. Originally its development focused on the creation of Electrostatic microscopes, but this approch was later abbandoned in favor of the Electromagnetic lens.
 
Zeiss is a German Manufactuer of Electron Microscopes, much like [[Siemens]] it was involved in the invention of the Electron Microsocpe. Originally its development focused on the creation of Electrostatic microscopes, but this approch was later abbandoned in favor of the Electromagnetic lens.
  
−
Only 2 models using exclusivly Electrostic Lenses are currently known to have existed, this is the experimental EM7, and the production EM8 microscope.
+
Zeiss Started developing electron microscopes together with AEG, under the engineering leadership of Ernst Brüche, focusing on the creation of Electrostatic Electron Microscopes. This aproch was later abandoned in favor of purely magnetic machines with the EM9, which also marked the departure from the cooperation with AEG. AEG-Zeiss where the first company to introduce the newly invented Stigmator by Otto Rang, first featured in the EM8. This new development allowed much higher resolutions then achieved before, and is now a standard part of every electron microscope.
 +
Zeiss later introduced the first commercial in column Energy filtered TEM with the EM902, featuring a [[Electron Energy Loss Spectroscopy | Castaing-Henry Filter]], then continuing this development with purely magnetic in column filters with the OMEGA, Corrected OMEGA and MANDOLINE Filters. Development and production of TEM's ceased in In January 2013<ref name="SALVE-III"/>.
 +
 
 +
Zeiss produced and continues to produce SEM as well, where they introduced the Electrostatic Electromagnetic GEMINI Column with the DSM982. Further more Zeiss produces optics, light microscopes, and much much more. (add more later)
 +
  
 
The EM9 marked the first all Electromagnetic Electron Microscope constructed by Carl Zeiss.
 
The EM9 marked the first all Electromagnetic Electron Microscope constructed by Carl Zeiss.
  
−
= List of Models =
+
= Transmition Electron Microscopes =
−
== Transmition Electron Microscopes ==  
+
{{#DeviceInfoBox2:tem|EM7|Zeiss - EM8 - B. v. Bories.png|
−
=== Early Models ===
+
OEM=File:Zeiss-Logo-ca-1975-recreation.png;
−
{{Tem list entry|Microscope Name=EM7|Microscope Picture File=Zeiss - EM8 - B. v. Bories.png|Year=|Successor=EM8|Magnification Range=|Magnification Gauge Type=|Specemin Chamber Pressure=|Power Consumption=|System Weught=|Accelerator Type=|Cathode Type=|Acceleration Voltage=|Stability=|Cathode Heating Methode=|Alignment Methode=|No. of Condensor Lenses=|Condensor Stability=|Condensor Stigmator=|Minimum Spot Size=|Condensor Alignment=|Condensor Lens Type=Electrostatic|Holder Type=|Travel Range=|Obj. Focal Length=|Obj. Adjustment Range=|Obj. Spherical Error=|Obj. Stability=|Obj. Stigmator=|Obj. Alignment Aid=|Point Resolution=|Obj. Lens Type=Electrostatic|No. of Proj. Lenses=|Proj. Stability=|Proj. Polpiece Config=|Proj. Mag=|Proj. Alignment=|Proj. Lens Type=Electrostatic}}
+
successor=EM8;
 +
accel_volt=60 KV (50 KV);
 +
objl_type=Electrostatic;
 +
proj_type=Electrostatic;
 +
year=1947;
 +
objl_res=20Å;
 +
mag_range=1500x, 5000x, 15000x;
 +
proj_no=2;
 +
|}}
 +
<br>
 +
 
 +
{{#DeviceInfoBox2:tem|EM8|File:Zeiss - EM8.png|
 +
OEM=File:Zeiss-Logo-ca-1975-recreation.png;
 +
successor=EM9;
 +
mag_range=900x, 1.6Kx, 3Kx, 5Kx, 9Kx, 16Kx;
 +
accel_volt=60 KV;
 +
accel=Steigerwald remote focus Triode;
 +
cath_type=Tungsten Hairpin;
 +
objl_res=7-9Å;
 +
objl_type=Electrostatic;
 +
objl_stig=Electrostatic Hexapol;
 +
proj_type=Electrostatic;
 +
proj_no=3;
 +
year=1948;
 +
|}}
 +
<br>
 +
 
 +
{{#DeviceInfoBox2:tem|EM9|File:Zeiss - EM9S - Meek.png|
 +
OEM=File:Zeiss-Logo-ca-1975-recreation.png;
 +
mag_range=1800x, 8000x, 26Kx, 60Kx, 0-60Kx;
 +
mag_gauge=Text and Bulb;
 +
power=1.8 KVA;
 +
weight=1320 lbs;
 +
successor=EM10;
 +
accel=Self Biased Triode;
 +
accel_volt=60 KV;
 +
cath_type=Tungsten Hairpin;
 +
conl_type=Electromagnetic;
 +
conl_no=1;
 +
objl_foc=4mm;
 +
objl_res=7-9Å;
 +
objl_type=Electromagnetic;
 +
objl_stig=Electrostatic Octopol;
 +
proj_type=Electromagnetic;
 +
proj_no=2;
 +
proj_conf=Single Polpiece;
 +
holder=Side Entry;
 +
|}}
 +
 
 +
{{#DeviceInfoBox2:tem|EM10||
 +
OEM=File:Zeiss-Logo-ca-1975-recreation.png;
 +
mag_range=100x, 1000x - 200Kx;
 +
mag_gauge=7-Seg. Digital;
 +
power=3.5 KVA;
 +
weight=800 Kg;
 +
accel_stab=2*10⁻⁶min;
 +
cath_heat=DC;
 +
successor=EM10A;
 +
accel=Self Biased Triode;
 +
accel_volt=20, 40, 60, 80, 100 KV;
 +
cath_type=Tungsten Hairpin;
 +
conl_type=Electromagnetic;
 +
conl_no=2;
 +
conl_stab=5*10⁻⁶/min;
 +
conl_stig=Quadropol;
 +
conl_spot=1 µm;
 +
xy=± 1 mm;
 +
objl_foc=2.6mm;
 +
objl_chrom=1.7 mm;
 +
objl_spher=2.2 mm;
 +
objl_stab=2*10⁻⁶/min;
 +
objl_res=5Å;
 +
objl_type=Electromagnetic;
 +
objl_stig=Octopol;
 +
proj_type=Electromagnetic;
 +
proj_no=2;
 +
proj_stab=2*10⁻⁶/min;
 +
proj_conf=Single Polpiece;
 +
proj_stig=Octopol;
 +
holder=Cartridge, Top Entery;
 +
chamber=5*10⁻⁵ Torr;
 +
acell_current=60 µA;
 +
|}}
 +
<br>
 +
{{#DeviceInfoBox2:tem|EM10A||
 +
OEM=File:Zeiss-Logo-ca-1975-recreation.png;
 +
mag_range=100x, 1000x - 200Kx;
 +
mag_gauge=7-Seg. Digital;
 +
power=3.5 KVA;
 +
weight=800 Kg;
 +
accel_stab=2*10⁻⁶min;
 +
cath_heat=DC;
 +
successor=EM10C;
 +
accel=Self Biased Triode;
 +
accel_volt=20, 40, 60, 80, 100 KV;
 +
cath_type=Tungsten Hairpin;
 +
conl_type=Electromagnetic;
 +
conl_no=2;
 +
conl_stab=5*10⁻⁶/min;
 +
conl_stig=Quadropol;
 +
conl_spot=1 µm;
 +
xy=± 1 mm;
 +
objl_foc=2.6mm;
 +
objl_chrom=1.7 mm;
 +
objl_spher=2.2 mm;
 +
objl_stab=2*10⁻⁶/min;
 +
objl_res=5Å;
 +
objl_type=Electromagnetic;
 +
objl_stig=Octopol;
 +
proj_type=Electromagnetic;
 +
proj_no=2;
 +
proj_stab=2*10⁻⁶/min;
 +
proj_conf=Single Polpiece;
 +
proj_stig=Octopol;
 +
holder=Cartridge, Top Entery;
 +
chamber=5*10⁻⁵ Torr;
 +
acell_current=60 µA;
 +
|}}
 +
<br>
 +
{{#DeviceInfoBox2:tem|EM10B||
 +
OEM=File:Zeiss-Logo-ca-1975-recreation.png;
 +
mag_range=100x, 1000x - 500Kx;
 +
mag_gauge=7-Seg. Digital;
 +
power=3.5 KVA;
 +
weight=800 Kg;
 +
accel_stab=2*10⁻⁶min;
 +
cath_heat=DC;
 +
successor=EM10CR;
 +
accel=Self Biased Triode;
 +
accel_volt=20, 40, 60, 80, 100 KV;
 +
cath_type=Tungsten Hairpin;
 +
conl_type=Electromagnetic;
 +
conl_no=2;
 +
conl_stab=5*10⁻⁶/min;
 +
conl_stig=Quadropol;
 +
conl_spot=200 nm;
 +
xy=± 1 mm;
 +
objl_foc=2.6mm;
 +
objl_chrom=1.7 mm;
 +
objl_spher=2.2 mm;
 +
objl_stab=2*10⁻⁶/min;
 +
objl_res=3Å;
 +
objl_type=Electromagnetic;
 +
objl_stig=Octopol;
 +
proj_type=Electromagnetic;
 +
proj_no=2;
 +
proj_stab=2*10⁻⁶/min;
 +
proj_conf=Single Polpiece;
 +
proj_stig=Octopol;
 +
holder=Cartridge, Top Entery;
 +
chamber=5*10⁻⁵ Torr;
 +
acell_current=60 µA;
 +
|}}
 +
<br>
 +
{{#DeviceInfoBox2:tem|EM10C/CR|File:Zeiss - EM10CR - STEM.jpg|
 +
OEM=File:Zeiss-Logo-ca-1975-recreation.png;
 +
mag_range=100x, 1000x - 500Kx;
 +
mag_gauge=7-Seg. Digital;
 +
power=3.5 KVA;
 +
weight=800 Kg;
 +
accel_stab=2*10⁻⁶min;
 +
cath_heat=DC;
 +
successor=EM10CR;
 +
accel=Self Biased Triode;
 +
accel_volt=20, 40, 60, 80, 100 KV;
 +
acell_current=60 µA;
 +
cath_type=Tungsten Hairpin;
 +
conl_type=Electromagnetic;
 +
conl_no=2;
 +
conl_stab=5*10⁻⁶/min;
 +
conl_stig=Quadropol;
 +
xy=± 1 mm;
 +
objl_foc=2.6mm;
 +
objl_chrom=1.7 mm;
 +
objl_spher=2.2 mm;
 +
objl_stab=2*10⁻⁶/min;
 +
objl_res=3Å;
 +
objl_type=Electromagnetic;
 +
objl_stig=Octopol;
 +
proj_type=Electromagnetic;
 +
proj_no=2;
 +
proj_stab=2*10⁻⁶/min;
 +
proj_conf=Single Polpiece;
 +
proj_stig=Octopol;
 +
holder=Cartridge, Top Entery;
 +
chamber=5*10⁻⁷ Torr;
 +
|}}
 +
<br>
 +
{{#DeviceInfoBox2:tem|EM109|File:Zeiss-em109-from-brochure.png|
 +
OEM=File:Zeiss-Logo-ca-1975-recreation.png;
 +
mag_range=150x, 1100x, 3000x, 20Kx, 30Kx, 250Kx, 400Kx;
 +
mag_gauge=7-Seg. Digital;
 +
accel_stab=8*10⁻⁶min;
 +
cath_heat=DC;
 +
accel=Self Biased Triode;
 +
accel_volt=50, 80 KV;
 +
cath_type=Tungsten Hairpin;
 +
conl_type=Electromagnetic;
 +
conl_no=2;
 +
conl_stab=6*10⁻⁶/min;
 +
conl_stig=Quadropol;
 +
conl_spot=3 µm;
 +
xy=± 1 mm;
 +
objl_foc=2.6mm;
 +
objl_chrom=1.7 mm;
 +
objl_spher=2.2 mm;
 +
objl_stab=4*10⁻⁶/min;
 +
objl_res=5Å;
 +
objl_type=Electromagnetic;
 +
objl_stig=Octopol;
 +
proj_type=Electromagnetic;
 +
proj_no=3;
 +
proj_stab=6*10⁻⁶/min;
 +
proj_conf=Single Polpiece;
 +
proj_stig=Octopol;
 +
holder=Cartridge, Top Entery;
 +
chamber=2*10⁻⁶ Torr;
 +
|}}
 +
<br>
 +
{{#DeviceInfoBox2:tem|EM900||
 +
OEM=File:Zeiss-Logo-ca-1975-recreation.png;
 +
accel=Self Biased Triode;
 +
cath_type=Tungsten Hairpin;
 +
conl_type=Electromagnetic;
 +
objl_type=Electromagnetic;
 +
proj_type=Electromagnetic;
 +
|}}
 +
<br>
 +
{{#DeviceInfoBox2:tem|EM902|File:Zeiss_EM902_From_manual_248.png|
 +
OEM=File:Zeiss-Logo-ca-1975-recreation.png;
 +
accel=Self Biased Triode;
 +
cath_type=Tungsten Hairpin;
 +
conl_type=Electromagnetic;
 +
objl_type=Electromagnetic;
 +
proj_type=Electromagnetic;
 +
|}}
 +
</br>
 +
<br>
 +
 
 +
 
 +
{{#DeviceInfoBox2:tem|CEM902|File:Zeiss_CEM902_from_Manual.png|
 +
OEM=File:Zeiss-Logo-ca-1975-recreation.png;
 +
accel=Self Biased Triode;
 +
cath_type=Tungsten Hairpin;
 +
conl_type=Electromagnetic;
 +
objl_type=Electromagnetic;
 +
proj_type=Electromagnetic;
 +
|}}
 +
</br>
 +
 
 +
{{#DeviceInfoBox2:tem|CEM902A|File:Zeiss CEM902A from Brochure.png|
 +
OEM=File:Zeiss-Logo-ca-1975-recreation.png;
 +
accel=Self Biased Triode;
 +
cath_type=Tungsten Hairpin;
 +
conl_type=Electromagnetic;
 +
objl_type=Electromagnetic;
 +
proj_type=Electromagnetic;
 +
|}}
 +
</br>
 +
 
 +
{{#DeviceInfoBox2:tem|EM906|File:LEO 906.png|
 +
OEM=File:Zeiss-Logo-ca-1975-recreation.png;
 +
accel=Self Biased Triode;
 +
cath_type=LaB6;
 +
conl_type=Electromagnetic;
 +
objl_type=Electromagnetic;
 +
proj_type=Electromagnetic;
 +
|}}
 +
</br>
 +
 
 +
{{#DeviceInfoBox2:tem|EM910|File:Zeiss_EM910.png|
 +
OEM=File:Zeiss-Logo-ca-1975-recreation.png;
 +
accel=Self Biased Triode;
 +
cath_type=LaB6;
 +
conl_type=Electromagnetic;
 +
objl_type=Electromagnetic;
 +
proj_type=Electromagnetic;
 +
|}}
 +
</br>
 +
 
 +
{{#DeviceInfoBox2:tem|EM912||
 +
OEM=File:Zeiss-Logo-ca-1975-recreation.png;
 +
accel=Self Biased Triode;
 +
cath_type=LaB6;
 +
conl_type=Electromagnetic;
 +
objl_type=Electromagnetic;
 +
proj_type=Electromagnetic;
 +
|}}
 +
</br>
 +
 
 +
{{#DeviceInfoBox2:tem|EM922||
 +
OEM=File:Zeiss-Logo-ca-1975-recreation.png;
 +
accel=Self Biased Triode;
 +
cath_type=LaB6;
 +
conl_type=Electromagnetic;
 +
objl_type=Electromagnetic;
 +
proj_type=Electromagnetic;
 +
|}}
 +
</br>
 +
 
 +
{{#DeviceInfoBox2:tem|Libra-120|File:Zeiss_Libra-120_From_Brochure.png|
 +
OEM=File:Zeiss-Logo-ca-1975-recreation.png;
 +
accel=Self Biased Triode;
 +
cath_type=LaB6/Tungsten Hairpin;
 +
conl_type=Electromagnetic;
 +
objl_type=Electromagnetic;
 +
proj_type=Electromagnetic;
 +
|}}
 +
</br>
 +
 
 +
{{#DeviceInfoBox2:tem|Libra-200|File:Zeiss_Libra-200FE_from_manual.PNG|
 +
OEM=File:Zeiss-Logo-ca-1975-recreation.png;
 +
cath_type=Schottky Field Emission;
 +
conl_type=Electromagnetic;
 +
objl_type=Electromagnetic;
 +
proj_type=Electromagnetic;
 +
accel_volt=200 KV;
 +
|}}
 +
</br>
 +
 
 +
{{#DeviceInfoBox2:tem|Centra 100||
 +
OEM=File:Zeiss-Logo-ca-1975-recreation.png;
 +
cath_type=Tungsten Hairpin;
 +
conl_type=Electromagnetic;
 +
objl_type=Electromagnetic;
 +
proj_type=Electromagnetic;
 +
objl_res=2Å;
 +
accel_volt=100 KV;
 +
year=2007;
 +
|}}
 +
</br>
 +
{{#DeviceInfoBox2:tem|Libra-200 CsTEM||
 +
OEM=File:Zeiss-Logo-ca-1975-recreation.png;
 +
cath_type=Schottky Field Emission;
 +
conl_type=Electromagnetic;
 +
objl_type=Electromagnetic;
 +
proj_type=Electromagnetic;
 +
accel_volt=200 KV;
 +
objl_res=0.8Å;
 +
|}}
 +
</br>
 +
{{#DeviceInfoBox2:tem|Libra-200 CsSTEM||
 +
OEM=File:Zeiss-Logo-ca-1975-recreation.png;
 +
cath_type=Schottky Field Emission;
 +
conl_type=Electromagnetic;
 +
objl_type=Electromagnetic;
 +
proj_type=Electromagnetic;
 +
accel_volt=200 KV;
 +
|}}
 +
</br>
 +
 
 +
 
 +
</br>
 +
 
 +
</br>
 +
 
 +
this list is incomplete
 +
 
 +
= Scanning Electron Microscope =
 +
{{SEM List Entry
 +
  |Microscope Name=NovaScan 30
 +
  |Microscope Picture File=Zeiss NovaScan 30.png
 +
  |Year=1974<ref name="novascan30">[[:File:N25D0098 - 34-720-d - Raster-Elektornenmikroskop NOVASCAN 30 - Compressed.pdf | Raster-Elektronenmikroskop NOVASCAN 30, Zeiss, 34-420-d]]</ref>
 +
  |Successor=
 +
  |Magnification Range=7X - 150 kX<ref name="novascan30"/>
 +
  |Magnification Gauge Type=
 +
  |Specemin Chamber Pressure=
 +
  |Power Consumption=3 kVA<ref name="novascan30"/>
 +
  |System Weight= ca. 500 kg<ref name="novascan30"/>
 +
  |Accelerator Type=Self Biased Triode Gun
 +
  |Cathode Type=Tungsten Hairpin
 +
  |Accelerating Voltage=1-5 kV, 15 kV, 30 kV<ref name="novascan30"/>
 +
  |Stability=
 +
  |Cathode Heating Methode=
 +
  |Alignment Methode=
 +
  |Number of Condensor Lenses=2<ref name="novascan30"/>
 +
  |Condensor Current Stability=
 +
  |Condensor Stigmator=
 +
  |Condensor Aperture=
 +
  |Condensor Alignment=
 +
  |Condensor Lens Type=
 +
  |Stage Type=
 +
  |Sample Holder Type=
 +
  |X, Y Travel Range= 25.4mm<ref name="novascan30"/>
 +
  |Z Travel Range=38 mm<ref name="novascan30"/>
 +
  |Tilt Range= -5° to +90°<ref name="novascan30"/>
 +
  |Rotation Range= 360°<ref name="novascan30"/>
 +
  |Working Distance=
 +
  |Objective Spherical Error=
 +
  |Objective Current Stability=
 +
  |Objective Stigmator= dual quadropole<ref name="novascan30"/>
 +
  |Deflection Type= double electromagnetic
 +
  |Point Resolution= 12.5 nm<ref name="novascan30"/>
 +
  |Lens Type=Electromagnetic
 +
  |Specimen Loading=Column Swingout
 +
  |Drive Mechanism=Micrometer (manual)
 +
}}
 +
 
 +
{{SEM List Entry
 +
  |Microscope Name=DSM-950
 +
  |Microscope Picture File=Zeiss DSM 950.png
 +
  |Year=1985<ref name="DSM-950">[[:File:N25D0020-_Digitales_Raster-Elektronenmikroskop_DSM_950_Produktinformation_-_Compressed.pdf | Digitales Raster-Elektronenmikroskop DSM 950]]</ref>
 +
  |Successor=
 +
  |Magnification Range=15 x- 200 kX<ref name="DSM-950"/>
 +
  |Magnification Gauge Type= CRT legend
 +
  |Specemin Chamber Pressure=
 +
  |Power Consumption=3 kVA<ref name="DSM-950"/>
 +
  |System Weight= 400 kg<ref name="DSM-950"/>
 +
  |Accelerator Type=Self Biased Triode Gun <ref name="DSM-950"/>
 +
  |Cathode Type=Tungsten Hairpin <ref name="DSM-950"/>
 +
  |Accelerating Voltage=0.5kV - 5 kV, 5 kV - 30 kV<ref name="DSM-950"/>
 +
  |Stability=
 +
  |Cathode Heating Methode=DC
 +
  |Alignment Methode= Electromagnetic
 +
  |Number of Condensor Lenses=2<ref name="DSM-950"/>
 +
  |Condensor Current Stability=
 +
  |Condensor Stigmator=
 +
  |Condensor Aperture=
 +
  |Condensor Alignment=
 +
  |Condensor Lens Type=
 +
  |Stage Type=
 +
  |Sample Holder Type=
 +
  |X, Y Travel Range= 25 mm<ref name="DSM-950"/>
 +
  |Z Travel Range=25mm <ref name="DSM-950"/>
 +
  |Tilt Range=
 +
  |Rotation Range= 360°<ref name="DSM-950"/>
 +
  |Working Distance=
 +
  |Objective Spherical Error=
 +
  |Objective Current Stability=
 +
  |Objective Stigmator= dual quadropole<ref name="DSM-950"/>
 +
  |Deflection Type= double electromagnetic
 +
  |Point Resolution= 5 nm<ref name="DSM-950"/>, 4 nm poossible<ref name="DSM-950"/>
 +
  |Lens Type=Electromagnetic
 +
  |Specimen Loading= Pull out Stage
 +
  |Drive Mechanism=Knob (manual)
 +
}}
 +
 
 +
{{SEM List Entry
 +
  |Microscope Name=DSM-940
 +
  |Microscope Picture File=Zeiss - DSM-940 - from Manual.png
 +
  |Year=
 +
  |Successor=DSM 940A
 +
  |Magnification Range= 15 x - 200 kx<ref name="DSM-940">[[:File:Zeiss - DSM940 Gebrauchsanleitung.pdf | Digitales Rasterelektronenmikroskop DSM 940 Gebrauchsanleitung]]</ref>
 +
  |Magnification Gauge Type= CRT legend<ref name="DSM-940"/>
 +
  |Specemin Chamber Pressure=
 +
  |Power Consumption=
 +
  |System Weight=
 +
  |Accelerator Type=Self Biased Triode Gun
 +
  |Cathode Type=Tungsten Hairpin
 +
  |Accelerating Voltage=1, 2, 3, 4, 5, 10, 15, 20, 30 kV<ref name="DSM-940"/>
 +
  |Stability=
 +
  |Cathode Heating Methode=DC
 +
  |Alignment Methode= Electromagnetic
 +
  |Number of Condensor Lenses=2<ref name="DSM-940"/>
 +
  |Condensor Current Stability=
 +
  |Condensor Stigmator=
 +
  |Condensor Aperture=
 +
  |Condensor Alignment=
 +
  |Condensor Lens Type=
 +
  |Stage Type= Eucentric
 +
  |Sample Holder Type=
 +
  |X, Y Travel Range= 25 mm<ref name="DSM-940"/>
 +
  |Z Travel Range=25 mm<ref name="DSM-940"/>
 +
  |Tilt Range= -15° to +90°<ref name="DSM-940"/>
 +
  |Rotation Range= 360°<ref name="DSM-940"/>
 +
  |Working Distance=
 +
  |Objective Spherical Error=
 +
  |Objective Current Stability=
 +
  |Objective Stigmator= Double Quadrupole
 +
  |Deflection Type=
 +
  |Point Resolution= 5 nm<ref name="DSM-940"/>
 +
  |Lens Type=Electromagnetic
 +
  |Specimen Loading= Pull out Stage
 +
  |Drive Mechanism=Knob (manual)
 +
}}
 +
 
 +
{{SEM List Entry
 +
  |Microscope Name=DSM-960
 +
  |Microscope Picture File=
 +
  |Year=
 +
  |Successor=DSM-960A
 +
  |Magnification Range=
 +
  |Magnification Gauge Type= CRT legend
 +
  |Specemin Chamber Pressure=
 +
  |Power Consumption=
 +
  |System Weight=
 +
  |Accelerator Type=Self Biased Triode Gun
 +
  |Cathode Type=Tungsten Hairpin
 +
  |Accelerating Voltage=
 +
  |Stability=
 +
  |Cathode Heating Methode=DC
 +
  |Alignment Methode= Electromagnetic
 +
  |Number of Condensor Lenses=2
 +
  |Condensor Current Stability=
 +
  |Condensor Stigmator=
 +
  |Condensor Aperture=
 +
  |Condensor Alignment=
 +
  |Condensor Lens Type=
 +
  |Stage Type=
 +
  |Sample Holder Type=
 +
  |X, Y Travel Range=  
 +
  |Z Travel Range=
 +
  |Tilt Range=
 +
  |Rotation Range=
 +
  |Working Distance=
 +
  |Objective Spherical Error=
 +
  |Objective Current Stability=
 +
  |Objective Stigmator= Double Quadrupole
 +
  |Deflection Type=
 +
  |Point Resolution=
 +
  |Lens Type=Electromagnetic
 +
  |Specimen Loading= Pull out Stage
 +
  |Drive Mechanism=Servo Motor / Knob (manual)
 +
}}
 +
 
 +
{{SEM List Entry
 +
  |Microscope Name=DSM-940A
 +
  |Microscope Picture File=Zeiss DSM 940A color.png
 +
  |Year=1991<ref name="DSM-940A"> Für Forschung und Routine. Universal Raster-Elektronenmikroskop DSM 940A</ref>
 +
  |Successor=
 +
  |Magnification Range=
 +
  |Magnification Gauge Type= CRT legend
 +
  |Specemin Chamber Pressure=
 +
  |Power Consumption=
 +
  |System Weight=
 +
  |Accelerator Type=Self Biased Triode Gun
 +
  |Cathode Type=Tungsten Hairpin
 +
  |Accelerating Voltage=
 +
  |Stability=
 +
  |Cathode Heating Methode=DC
 +
  |Alignment Methode= Electromagnetic
 +
  |Number of Condensor Lenses=2
 +
  |Condensor Current Stability=
 +
  |Condensor Stigmator=
 +
  |Condensor Aperture=
 +
  |Condensor Alignment=
 +
  |Condensor Lens Type=
 +
  |Stage Type=
 +
  |Sample Holder Type=
 +
  |X, Y Travel Range= 25 mm
 +
  |Z Travel Range=25mm
 +
  |Tilt Range=
 +
  |Rotation Range= 360°
 +
  |Working Distance=
 +
  |Objective Spherical Error=
 +
  |Objective Current Stability=
 +
  |Objective Stigmator= dual quadropole
 +
  |Deflection Type= double electromagnetic
 +
  |Point Resolution=  
 +
  |Lens Type=Electromagnetic
 +
  |Specimen Loading= Pull out Stage
 +
  |Drive Mechanism=Knob (manual)
 +
}}
 +
 
 +
{{SEM List Entry
 +
  |Microscope Name=DSM-960A
 +
  |Microscope Picture File=Zeiss DSM 960A.png
 +
  |Year=1991<ref name="DSM-960A">[[:File:N24D0006 -34-921-d Printed in Germany CM-TS-VII91 Uoo 01 91 - DSM 960A - Für die Analytik in Mikrobereichen Hochleistungs-Raster- Elektronenmikroskop DSM 960 A.pdf | Für die Analytik in mikrobereichen. Hochleistungs-Raster-Elektronenmikroskop DSM 960A]]</ref>
 +
  |Successor=
 +
  |Magnification Range=4 x - 300 kx<ref name="DSM-960A"/>
 +
  |Magnification Gauge Type= CRT legend<ref name="DSM-960A"/>
 +
  |Specemin Chamber Pressure=
 +
  |Power Consumption=
 +
  |System Weight=
 +
  |Accelerator Type=Self Biased Triode Gun
 +
  |Cathode Type=Tungsten Hairpin / LaB₆<ref name="DSM-960A"/>
 +
  |Accelerating Voltage=490 v - 5 kV, 5 kV - 30 kV<ref name="DSM-960A"/>
 +
  |Stability=
 +
  |Cathode Heating Methode=DC
 +
  |Alignment Methode= Electromagnetic
 +
  |Number of Condensor Lenses=2
 +
  |Condensor Current Stability=
 +
  |Condensor Stigmator=
 +
  |Condensor Aperture=
 +
  |Condensor Alignment=
 +
  |Condensor Lens Type=
 +
  |Stage Type=Eucentric
 +
  |Sample Holder Type=
 +
  |X, Y Travel Range= 80 mm<ref name="DSM-960A"/>
 +
  |Z Travel Range=30mm<ref name="DSM-960A"/>
 +
  |Tilt Range= -15° to +90°<ref name="DSM-960A"/>
 +
  |Rotation Range= 360°<ref name="DSM-960A"/>
 +
  |Working Distance=
 +
  |Objective Spherical Error=
 +
  |Objective Current Stability=
 +
  |Objective Stigmator= dual quadropole
 +
  |Deflection Type= double electromagnetic
 +
  |Point Resolution= 4 nm (W) / 3.5nm (LaB₆)<ref name="DSM-960A"/>
 +
  |Lens Type=Electromagnetic
 +
  |Specimen Loading= Pull out Stage
 +
  |Drive Mechanism=Servo Motor / Knob (manual)
 +
}}
 +
 
 +
{{SEM List Entry
 +
  |Microscope Name=DSM-962
 +
  |Microscope Picture File=Zeiss DSM 962.png
 +
  |Year=
 +
  |Successor=
 +
  |Magnification Range=
 +
  |Magnification Gauge Type= CRT legend
 +
  |Specemin Chamber Pressure=
 +
  |Power Consumption=
 +
  |System Weight=
 +
  |Accelerator Type=Self Biased Triode Gun
 +
  |Cathode Type=Tungsten Hairpin / LaB₆
 +
  |Accelerating Voltage=
 +
  |Stability=
 +
  |Cathode Heating Methode=DC
 +
  |Alignment Methode= Electromagnetic
 +
  |Number of Condensor Lenses=2
 +
  |Condensor Current Stability=
 +
  |Condensor Stigmator=
 +
  |Condensor Aperture=
 +
  |Condensor Alignment=
 +
  |Condensor Lens Type=
 +
  |Stage Type=Eucentric
 +
  |Sample Holder Type=
 +
  |X, Y Travel Range= 80 mm
 +
  |Z Travel Range=30mm
 +
  |Tilt Range= -15° to +90°
 +
  |Rotation Range= 360°
 +
  |Working Distance=
 +
  |Objective Spherical Error=
 +
  |Objective Current Stability=
 +
  |Objective Stigmator= dual quadropole
 +
  |Deflection Type= double electromagnetic
 +
  |Point Resolution=
 +
  |Lens Type=Electromagnetic
 +
  |Specimen Loading= Pull out Stage
 +
  |Drive Mechanism=Servo Motor / Knob (manual)
 +
}}
 +
 
 +
{{SEM List Entry
 +
  |Microscope Name=DSM-982 GEMINI
 +
  |Microscope Picture File=Zeiss - DSM-982 GEMINI - from N25D0080.png
 +
  |Year=1993<ref name="dsm-982">Feldemissions-Raster-Elektronenmikroskop DSM-982 GEMINI, N25D0080</ref>
 +
  |Successor=LEO 982
 +
  |Magnification Range= up to 700 kx<ref name="dsm-982"/>
 +
  |Magnification Gauge Type= CRT legend, Plasma Display
 +
  |Specemin Chamber Pressure=
 +
  |Power Consumption=
 +
  |System Weight=
 +
  |Accelerator Type=
 +
  |Cathode Type=Schottky FEG<ref name="dsm-982"/>
 +
  |Accelerating Voltage=200 v - 30kV<ref name="dsm-982"/>
 +
  |Stability=
 +
  |Cathode Heating Methode=DC
 +
  |Alignment Methode= Electromagnetic / Mechanical
 +
  |Number of Condensor Lenses=1<ref name="dsm-982"/>
 +
  |Condensor Current Stability=
 +
  |Condensor Stigmator=
 +
  |Condensor Aperture=
 +
  |Condensor Alignment=
 +
  |Condensor Lens Type=
 +
  |Stage Type=Eucentric
 +
  |Sample Holder Type=
 +
  |X, Y Travel Range= 80 mm<ref name="dsm-982"/>
 +
  |Z Travel Range=30mm<ref name="dsm-982"/>
 +
  |Tilt Range= -15° to +90°<ref name="dsm-982"/>
 +
  |Rotation Range= 360°<ref name="dsm-982"/>
 +
  |Working Distance=
 +
  |Objective Spherical Error=
 +
  |Objective Current Stability=
 +
  |Objective Stigmator= dual quadropole
 +
  |Deflection Type= double electromagnetic
 +
  |Point Resolution= 1.2 mn (20kV)<ref name="dsm-982"/>, 2.5 nm (5kV)<ref name="dsm-982"/>, 4nm (1kV)<ref name="dsm-982"/>
 +
  |Lens Type=Electromagnetic
 +
  |Specimen Loading= Pull out Stage<ref name="dsm-982"/>
 +
  |Drive Mechanism=Servo Motor / Knob (manual)<ref name="dsm-982"/>
 +
}}
 +
 
 +
= Special Projects =
 +
== Project SATEM / PACEM ==
 +
The SATEM ('''S'''ub '''Å'''ngström '''T'''ransmission '''E'''lectron '''M'''ictroscope) was a Libra 200 based machine intended to achieve the highest spacial resolution achievable at the time, it featured a Image Side Spherical Aberation Corrector made by {{CEOS}}, and like SESAM, it featured a Pendulum Mount. Later the machine was retrofitted to be a Phase Contrast TEM, and was renamed PACEM
 +
 
 +
== Project SESAM ==
 +
Main Article: {{Zeiss SESAM}}
 +
</br>
 +
[[File:Zeiss - SESAM - 2020.png|thumb|The Zeiss SESAM (SESAM III) as seen in 2020. ]]
 +
Project SESAM ('''S'''ub '''E'''lectronvolt '''S'''ub '''Å'''ngström '''M'''ictroscope) was a project running from 1996 to 2007 in which the goal was to create a Energy Filtered Electron Microscope ({Electron Energy Loss Spectroscopy | EF-TEM}) capable of having an energy resolution below 1eV while also having very high spacial resolution. (complete description later)
 +
 
 +
Three machines where built in the project, of which only 1 survived to the current day. The first being based on the EM922 (SESAM 1) and working based on a Corrected Omega Filter with a LaB6 Electron Gun. The second was the archetype for the later Libra-200 series (SESAM II) and featured the same Corrected Omega Filter as the SESAM 1, but used an Electrostatic Omega Filtered Schottky FEG. The third and final machine was the SESAM (SESAM III) featuring the newly developed MANDOLINE Filter, based on a Libra-200, and also featuring a Electrostatic Omega Filtered Schottky FEG.  It also featured a Pendulum mounted column within a large frame.
 +
Of the three machines, only the SESAM (SESAM III) survived, and is currently stored at the Museum For Electron Microscopy Nuremburg (Germany), where it will soon go on display, and later be usable again.
 +
 
 +
=== SESAM I ===
 +
SESAM I was based on a EM922, and featured a the first Corrected OMEGA Filter. It originally used a LaB6 electron gun, but was later fitted with a Electrostatic Omega monochromated Shottkey Gun. The machine was lost in a fire.
 +
 
 +
=== SESAM II ===
 +
Archetype of the Libra 200, Originally Located at Max Plank Institute for Solid State Physics in Stuttgart Germany, where it later gave way to the SESAM III, based on anecdotes it was moved to the University Tübingen, where it was ultimately scrapped. Its Electron Gun was fitted to the SESAM I.
 +
 
 +
=== SESAM (SESAM III) ===
 +
Originally Located in the Max Plank Institute for Solid State Physics in Stuttgart Germany, it was installed in 2007 and was in operation until 2024 where it suffered a technical defect, after which it was transferred to the Museum.
  
−
{{Tem list entry|Microscope Name=EM8|Microscope Picture File=Zeiss - EM8.png|Year=|Successor=EM9|Magnification Range=|Magnification Gauge Type=|Specemin Chamber Pressure=|Power Consumption=|System Weught=|Accelerator Type=|Cathode Type=|Acceleration Voltage=|Stability=|Cathode Heating Methode=|Alignment Methode=|No. of Condensor Lenses=|Condensor Stability=|Condensor Stigmator=|Minimum Spot Size=|Condensor Alignment=|Condensor Lens Type=Electrostatic|Holder Type=|Travel Range=|Obj. Focal Length=|Obj. Adjustment Range=|Obj. Spherical Error=|Obj. Stability=|Obj. Stigmator=|Obj. Alignment Aid=|Point Resolution=|Obj. Lens Type=Electrostatic|No. of Proj. Lenses=2|Proj. Stability=|Proj. Polpiece Config=|Proj. Mag=|Proj. Alignment=|Proj. Lens Type=Electrostatic}}
+
== Project CRISP ==
 +
Project CRISP ('''C'''orrected '''I'''llumination '''S'''canning '''P'''robe) was a special Libra 200 based machine built in 2007, and was one of the first energy filtered monochromated abberation corrected STEM in the world, it features a Probe side abberation corrector from {{CEOS}} as well as a Electrostatic Omega Filtered Shottkey FEG, and a corrected Omega In column Filter.
  
−
{{Tem list entry|Microscope Name=EM9|Microscope Picture File=Zeiss - EM9S - Meek.png|Year=|Successor=EM10|Magnification Range=|Magnification Gauge Type=|Specemin Chamber Pressure=|Power Consumption=|System Weught=|Accelerator Type=|Cathode Type=|Acceleration Voltage=|Stability=|Cathode Heating Methode=|Alignment Methode=|No. of Condensor Lenses=|Condensor Stability=|Condensor Stigmator=|Minimum Spot Size=|Condensor Alignment=|Condensor Lens Type=|Holder Type=|Travel Range=|Obj. Focal Length=|Obj. Adjustment Range=|Obj. Spherical Error=|Obj. Stability=|Obj. Stigmator=|Obj. Alignment Aid=|Point Resolution=|Obj. Lens Type=Electromagnetic|No. of Proj. Lenses=|Proj. Stability=|Proj. Polpiece Config=|Proj. Mag=|Proj. Alignment=|Proj. Lens Type=}}
+
== Project SALVE ==
 +
Project SALVE ('''S'''ub '''Å'''ngström '''L'''ow '''V'''oltage '''E'''lectron Microscope) was aimed at creating a TEM for very low voltages observations of Radiation-Sensitive materials at ultra high resolutions, at the university ULM. The project initially was based on the Libra-200 in cooperation between Zeiss and CEOS.
 +
The SALVE I was made as a feasibility study <ref name="SALVE-III">{https://www.salve-project.de/about/about_salve/index.html | About SALVE III}</ref> started in January 1st 2009 and lasted until December 31st 2010<ref name="SALVE-III"/>. Based on the original SALVE I column, SALVE II was built, featuring a new Cc/Cs Corrector from CEOS.  
 +
In January 2013, Zeiss ceased production and development of TEM's<ref name="SALVE-III"/> and a new cooperation partner was found in FEI, where the SALVE III was then produced
  
 +
== Project KRONOS ==
 +
Main Article: [[Zeiss KRONOS]]
 +
</br>
 +
Project KRONOS is a Phase contrast aberration corrected Cryo EM. (add more text later)
  
 +
= Refrences =
 +
<references />
  
−
=== Orange Column Models ===
 
−
It should be noted that this list is far from complete, and many models are yet missing within!
 
  
 
= Documentation =
 
= Documentation =
−
Full list of all documents related to the Siemens Electron Microscopes.
+
Full list of all documents related to the Zeiss Electron Microscopes.
−
== English ==
+
== Transmission Electron Microscope ==
 
{{#tree:
 
{{#tree:
 
*English
 
*English
Line 27: Line 731:
 
***Manuals
 
***Manuals
 
****{"icon":false}{{#l:Zeiss - EM10AB - Operating Instructions - Part A - Description.pdf|Part A - Description}}
 
****{"icon":false}{{#l:Zeiss - EM10AB - Operating Instructions - Part A - Description.pdf|Part A - Description}}
 +
****{"icon":false}{{#l:Zeiss - EM10AB - Operating Instructions - Part B - Operating the Aligned Instrument.pdf|Part B - Operating the Aligned Instrument}}
 
****{"icon":false}{{#l:Zeiss - EM10AB - Operating Instructions - Part C - Alignment.pdf|Part C - Alignment}}
 
****{"icon":false}{{#l:Zeiss - EM10AB - Operating Instructions - Part C - Alignment.pdf|Part C - Alignment}}
 +
****{"icon":false}{{#l:Zeiss - EM10AB - Opperating Instructions - Part G - High-resolution Goniometer.pdf|Part G - High-resolution Goniometer}}
 
****{"icon":false}{{#l:Zeiss - EM10AB - Part M - Manipulation Cartridges.pdf|Part M - Manipulation Cartridges}}
 
****{"icon":false}{{#l:Zeiss - EM10AB - Part M - Manipulation Cartridges.pdf|Part M - Manipulation Cartridges}}
 
*German
 
*German
 
**EM8
 
**EM8
 
*** Bedienungsanleitung
 
*** Bedienungsanleitung
−
****{"icon":false}{{#l:Zeiss - EM8 - Kurtzanleitung.pdf|Kurtzanleitung}}
+
****{"icon":false}{{#l:Zeiss - EM8 - Kurtzanleitung.pdf|EM 8 - Kurtzanleitung}}
 +
****{"icon":false}{{#l:Zeiss - G 34-503-d - Elektronenmikroskop EM8 - Gebrauchsanweisung Text.pdf|G 34-503-d - Elektronenmikroskop EM8 - Gebrauchsanweisung Text}}
 +
****{"icon":false}{{#l:Zeiss - G 34-503-d - Elektronenmikroskop EM8 - Gebrauchsanweisung Bildteil.pdf|G 34-503-d - Elektronenmikroskop EM8 - Gebrauchsanweisung Bildteil}}
 
**EM9A
 
**EM9A
 +
***Manuals
 +
****{"icon":false}{{#l:Zeiss - G 34 - 541 - EM9 - Bedienungsanleitung.pdf|G34-541 - Elektronenmikroskop EM9A - Bedienungsanleitung}}
 +
***Brochüre
 +
****{"icon":false}{{#l:Zeiss - 34-547-d - EM9A Brochure.pdf|34-547-d - Elektronenmikroskop EM9A}}
 +
****{"icon":false}{{#l:Zeiss - 34-554-d - EM9S2 - Brochure.pdf|34-554-d - Elektronenmikroskop EM9S-2}}
 +
**EM10
 
***Brochüre
 
***Brochüre
−
****{"icon":false}{{#l:Zeiss - EM9A Brochure.pdf|Elektronenmikroskop EM9A}}
+
****{"icon":false}{{#l:Zeiss - 34-590-d - Hochleistungs Elektronenenmikroskop EM10 - Brochure.pdf|34-590-d - Hochleistungs Elektronenenmikroskop EM10 - Brochure}}
 
**EM10A/B
 
**EM10A/B
 
***Bedienungsanleitung
 
***Bedienungsanleitung
 
****{"icon":false}{{#l:Zeiss - EM10AB - Bedienungsanleitung - Teil M - Manipulations-Patronen.pdf|Teil M - Manipulations-Patronen}}
 
****{"icon":false}{{#l:Zeiss - EM10AB - Bedienungsanleitung - Teil M - Manipulations-Patronen.pdf|Teil M - Manipulations-Patronen}}
 
**EM10C/CR
 
**EM10C/CR
−
***Manuals
+
***Bedienungsanleitung
 
****{"icon":false}{{#l:Zeoss - EM10C - Bedienungsanleitung - Teil A - Beschreibung.pdf|Teil A - Beschreibung}}
 
****{"icon":false}{{#l:Zeoss - EM10C - Bedienungsanleitung - Teil A - Beschreibung.pdf|Teil A - Beschreibung}}
 
****{"icon":false}{{#l:Zeiss EM10 - Bedienungsanleitung - Teild D - Wartung und Plfäge.pdf|Teil D - Wartung und Plfäge}}
 
****{"icon":false}{{#l:Zeiss EM10 - Bedienungsanleitung - Teild D - Wartung und Plfäge.pdf|Teil D - Wartung und Plfäge}}
−
*Werkzeitschrift
+
**EM109
−
**{"icon":false}{{#l:Zeiss - Werkzeitschrift - 42.pdf|Werkzeitschrift Nr. 42 (unvollständig)}}
+
***Brochüre
 +
****{"icon":false}{{#l:Zeiss - 34-820-d - EM109 - Brochure.pdf|34-820-d - EM109 - Brochure}}
 +
 
 
}}
 
}}
 +
== Scanning Electron Microscopes ==
 +
{{#tree:
 +
*German
 +
**DSM940
 +
***{"icon":false}{{#l:Zeiss - DSM940 Gebrauchsanleitung.pdf|DSM940 Gebrauchsanleitung}}
 +
***{"icon":false}{{#l:Zeiss . Zusatz - Split Screen Variables Raster - Bedienungsanweisung.pdf|Split Screen Variables Raster - Bedienungsanweisung}}
 +
***{"icon":false}{{#l:Zeiss - G 34 - 935d - Raster-Elektronenmikroskop-Zusatz - 35 mm Kamera - Gebrauchsanweisung.pdf|35 mm Kamera - Gebrauchsanweisung}}
 +
}}
 +
== Miscilanious ==
 +
{{#tree:
 +
*German
 +
**Werkzeitschrift
 +
***{"icon":false}{{#l:Zeiss - Werkzeitschrift - 42.pdf|Werkzeitschrift Nr. 42 (unvollständig)}}
  
 +
}}
  
 +
= stuff =
  
 
{| class="wikitable"
 
{| class="wikitable"
Line 163: Line 894:
 
|style="text-align:center;"|
 
|style="text-align:center;"|
 
|}
 
|}
 +
= Refrences =
 +
<references />
  
 +
[[Category:EM Templates]]
 
[[Category:Electron Microscope]]
 
[[Category:Electron Microscope]]
 +
[[Category:Pages with broken file links]]
 +
[[Category:Pages with reference errors]]

Latest revision as of 23:32, 27 August 2026

Vector recreation of the Zeiss logo as around 1975

Zeiss is a German Manufactuer of Electron Microscopes, much like Siemens it was involved in the invention of the Electron Microsocpe. Originally its development focused on the creation of Electrostatic microscopes, but this approch was later abbandoned in favor of the Electromagnetic lens.

Zeiss Started developing electron microscopes together with AEG, under the engineering leadership of Ernst Brüche, focusing on the creation of Electrostatic Electron Microscopes. This aproch was later abandoned in favor of purely magnetic machines with the EM9, which also marked the departure from the cooperation with AEG. AEG-Zeiss where the first company to introduce the newly invented Stigmator by Otto Rang, first featured in the EM8. This new development allowed much higher resolutions then achieved before, and is now a standard part of every electron microscope. Zeiss later introduced the first commercial in column Energy filtered TEM with the EM902, featuring a Castaing-Henry Filter, then continuing this development with purely magnetic in column filters with the OMEGA, Corrected OMEGA and MANDOLINE Filters. Development and production of TEM's ceased in In January 2013[1].

Zeiss produced and continues to produce SEM as well, where they introduced the Electrostatic Electromagnetic GEMINI Column with the DSM982. Further more Zeiss produces optics, light microscopes, and much much more. (add more later)


The EM9 marked the first all Electromagnetic Electron Microscope constructed by Carl Zeiss.

Transmition Electron Microscopes





General
Year 1947
Successor EM8
Mag. Range 1500x, 5000x, 15000x
Electron Source
Acellerating Voltage 60 KV (50 KV)
Objective
Lens Type Electrostatic
Resolution 20Å
Projective Lens
Lens Type Electrostatic
No. of Lenses 2








General
Year 1948
Successor EM9
Mag. Range 900x, 1.6Kx, 3Kx, 5Kx, 9Kx, 16Kx
Electron Source
Accelerator Type Steigerwald remote focus Triode
Acellerating Voltage 60 KV
Cathode Tungsten Hairpin
Objective
Lens Type Electrostatic
Stigmator Electrostatic Hexapol
Resolution 7-9Å
Projective Lens
Lens Type Electrostatic
No. of Lenses 3










General
Successor EM10
Mag. Range 1800x, 8000x, 26Kx, 60Kx, 0-60Kx
Mag. Gauge Text and Bulb
Power Requirment 1.8 KVA
System Weight 1320 lbs
Electron Source
Accelerator Type Self Biased Triode
Acellerating Voltage 60 KV
Cathode Tungsten Hairpin
Condenser
Lens Type Electromagnetic
Nu. of Lenses 1
Stage
Holder Type Side Entry
Objective
Lens Type Electromagnetic
Focal Length 4mm
Stigmator Electrostatic Octopol
Resolution 7-9Å
Projective Lens
Lens Type Electromagnetic
No. of Lenses 2
Configuration Single Polpiece









General
Successor EM10A
Mag. Range 100x, 1000x - 200Kx
Mag. Gauge 7-Seg. Digital
Chamber Pressure 5*10⁻⁵ Torr
Power Requirment 3.5 KVA
System Weight 800 Kg
Electron Source
Accelerator Type Self Biased Triode
Acellerating Voltage 20, 40, 60, 80, 100 KV
Stability 2*10⁻⁶min
Cathode Tungsten Hairpin
Cathode Heating DC
Condenser
Lens Type Electromagnetic
Nu. of Lenses 2
Stability 5*10⁻⁶/min
Stigmator Quadropol
Spot Size 1 µm
Stage
Holder Type Cartridge, Top Entery
Objective
Lens Type Electromagnetic
Focal Length 2.6mm
Stability 2*10⁻⁶/min
Stigmator Octopol
Spherical Error 2.2 mm
Chromatic Error 1.7 mm
Resolution 5Å
Projective Lens
Lens Type Electromagnetic
No. of Lenses 2
Stability 2*10⁻⁶/min
Configuration Single Polpiece
Stigmator Octopol









General
Successor EM10C
Mag. Range 100x, 1000x - 200Kx
Mag. Gauge 7-Seg. Digital
Chamber Pressure 5*10⁻⁵ Torr
Power Requirment 3.5 KVA
System Weight 800 Kg
Electron Source
Accelerator Type Self Biased Triode
Acellerating Voltage 20, 40, 60, 80, 100 KV
Stability 2*10⁻⁶min
Cathode Tungsten Hairpin
Cathode Heating DC
Condenser
Lens Type Electromagnetic
Nu. of Lenses 2
Stability 5*10⁻⁶/min
Stigmator Quadropol
Spot Size 1 µm
Stage
Holder Type Cartridge, Top Entery
Objective
Lens Type Electromagnetic
Focal Length 2.6mm
Stability 2*10⁻⁶/min
Stigmator Octopol
Spherical Error 2.2 mm
Chromatic Error 1.7 mm
Resolution 5Å
Projective Lens
Lens Type Electromagnetic
No. of Lenses 2
Stability 2*10⁻⁶/min
Configuration Single Polpiece
Stigmator Octopol









General
Successor EM10CR
Mag. Range 100x, 1000x - 500Kx
Mag. Gauge 7-Seg. Digital
Chamber Pressure 5*10⁻⁵ Torr
Power Requirment 3.5 KVA
System Weight 800 Kg
Electron Source
Accelerator Type Self Biased Triode
Acellerating Voltage 20, 40, 60, 80, 100 KV
Stability 2*10⁻⁶min
Cathode Tungsten Hairpin
Cathode Heating DC
Condenser
Lens Type Electromagnetic
Nu. of Lenses 2
Stability 5*10⁻⁶/min
Stigmator Quadropol
Spot Size 200 nm
Stage
Holder Type Cartridge, Top Entery
Objective
Lens Type Electromagnetic
Focal Length 2.6mm
Stability 2*10⁻⁶/min
Stigmator Octopol
Spherical Error 2.2 mm
Chromatic Error 1.7 mm
Resolution 3Å
Projective Lens
Lens Type Electromagnetic
No. of Lenses 2
Stability 2*10⁻⁶/min
Configuration Single Polpiece
Stigmator Octopol









General
Successor EM10CR
Mag. Range 100x, 1000x - 500Kx
Mag. Gauge 7-Seg. Digital
Chamber Pressure 5*10⁻⁷ Torr
Power Requirment 3.5 KVA
System Weight 800 Kg
Electron Source
Accelerator Type Self Biased Triode
Acellerating Voltage 20, 40, 60, 80, 100 KV
Stability 2*10⁻⁶min
Cathode Tungsten Hairpin
Cathode Heating DC
Condenser
Lens Type Electromagnetic
Nu. of Lenses 2
Stability 5*10⁻⁶/min
Stigmator Quadropol
Stage
Holder Type Cartridge, Top Entery
Objective
Lens Type Electromagnetic
Focal Length 2.6mm
Stability 2*10⁻⁶/min
Stigmator Octopol
Spherical Error 2.2 mm
Chromatic Error 1.7 mm
Resolution 3Å
Projective Lens
Lens Type Electromagnetic
No. of Lenses 2
Stability 2*10⁻⁶/min
Configuration Single Polpiece
Stigmator Octopol









General
Mag. Range 150x, 1100x, 3000x, 20Kx, 30Kx, 250Kx, 400Kx
Mag. Gauge 7-Seg. Digital
Chamber Pressure 2*10⁻⁶ Torr
Electron Source
Accelerator Type Self Biased Triode
Acellerating Voltage 50, 80 KV
Stability 8*10⁻⁶min
Cathode Tungsten Hairpin
Cathode Heating DC
Condenser
Lens Type Electromagnetic
Nu. of Lenses 2
Stability 6*10⁻⁶/min
Stigmator Quadropol
Spot Size 3 µm
Stage
Holder Type Cartridge, Top Entery
Objective
Lens Type Electromagnetic
Focal Length 2.6mm
Stability 4*10⁻⁶/min
Stigmator Octopol
Spherical Error 2.2 mm
Chromatic Error 1.7 mm
Resolution 5Å
Projective Lens
Lens Type Electromagnetic
No. of Lenses 3
Stability 6*10⁻⁶/min
Configuration Single Polpiece
Stigmator Octopol







Electron Source
Accelerator Type Self Biased Triode
Cathode Tungsten Hairpin
Condenser
Lens Type Electromagnetic
Objective
Lens Type Electromagnetic
Projective Lens
Lens Type Electromagnetic







Electron Source
Accelerator Type Self Biased Triode
Cathode Tungsten Hairpin
Condenser
Lens Type Electromagnetic
Objective
Lens Type Electromagnetic
Projective Lens
Lens Type Electromagnetic









Electron Source
Accelerator Type Self Biased Triode
Cathode Tungsten Hairpin
Condenser
Lens Type Electromagnetic
Objective
Lens Type Electromagnetic
Projective Lens
Lens Type Electromagnetic








Electron Source
Accelerator Type Self Biased Triode
Cathode Tungsten Hairpin
Condenser
Lens Type Electromagnetic
Objective
Lens Type Electromagnetic
Projective Lens
Lens Type Electromagnetic








Electron Source
Accelerator Type Self Biased Triode
Cathode LaB6
Condenser
Lens Type Electromagnetic
Objective
Lens Type Electromagnetic
Projective Lens
Lens Type Electromagnetic








Electron Source
Accelerator Type Self Biased Triode
Cathode LaB6
Condenser
Lens Type Electromagnetic
Objective
Lens Type Electromagnetic
Projective Lens
Lens Type Electromagnetic








Electron Source
Accelerator Type Self Biased Triode
Cathode LaB6
Condenser
Lens Type Electromagnetic
Objective
Lens Type Electromagnetic
Projective Lens
Lens Type Electromagnetic








Electron Source
Accelerator Type Self Biased Triode
Cathode LaB6
Condenser
Lens Type Electromagnetic
Objective
Lens Type Electromagnetic
Projective Lens
Lens Type Electromagnetic








Electron Source
Accelerator Type Self Biased Triode
Cathode LaB6/Tungsten Hairpin
Condenser
Lens Type Electromagnetic
Objective
Lens Type Electromagnetic
Projective Lens
Lens Type Electromagnetic








Electron Source
Acellerating Voltage 200 KV
Cathode Schottky Field Emission
Condenser
Lens Type Electromagnetic
Objective
Lens Type Electromagnetic
Projective Lens
Lens Type Electromagnetic









General
Year 2007
Electron Source
Acellerating Voltage 100 KV
Cathode Tungsten Hairpin
Condenser
Lens Type Electromagnetic
Objective
Lens Type Electromagnetic
Resolution 2Å
Projective Lens
Lens Type Electromagnetic







Electron Source
Acellerating Voltage 200 KV
Cathode Schottky Field Emission
Condenser
Lens Type Electromagnetic
Objective
Lens Type Electromagnetic
Resolution 0.8Å
Projective Lens
Lens Type Electromagnetic







Electron Source
Acellerating Voltage 200 KV
Cathode Schottky Field Emission
Condenser
Lens Type Electromagnetic
Objective
Lens Type Electromagnetic
Projective Lens
Lens Type Electromagnetic






this list is incomplete

Scanning Electron Microscope

NovaScan 30
Zeiss NovaScan 30.png
General
Year 1974[2]
Successor [[]]
Magnification Range 7X - 150 kX[2]
Magnification Gauge Type
Specemin Chamber Pressure
Power Consumption 3 kVA[2]
System Weight ca. 500 kg[2]
Electrion Source
Accelerator Type Self Biased Triode Gun
Cathode Type Tungsten Hairpin
Accelerating Voltage 1-5 kV, 15 kV, 30 kV[2]
Stability
Cathode Heating Methode
Alignment Methode
Condensor
Number of Condensor Lenses 2[2]
Current Stability
Stigmator
Aperture
Condensor Alignment
Lens Type
Stage
Stage Type
Specimen Loading Column Swingout
Sample Holder Type
X, Y Travel Range 25.4mm[2]
Z Travel Range 38 mm[2]
Tilt Range -5° to +90°[2]
Rotation Range 360°[2]
Drive Mechanism Micrometer (manual)
Objective Lens
Working Distance
Spherical Error
Current Stability
Stigmator dual quadropole[2]
Deflection Type double electromagnetic
Point Resolution 12.5 nm[2]
Lens Type Electromagnetic


DSM-950
Zeiss DSM 950.png
General
Year 1985[3]
Successor [[]]
Magnification Range 15 x- 200 kX[3]
Magnification Gauge Type CRT legend
Specemin Chamber Pressure
Power Consumption 3 kVA[3]
System Weight 400 kg[3]
Electrion Source
Accelerator Type Self Biased Triode Gun [3]
Cathode Type Tungsten Hairpin [3]
Accelerating Voltage 0.5kV - 5 kV, 5 kV - 30 kV[3]
Stability
Cathode Heating Methode DC
Alignment Methode Electromagnetic
Condensor
Number of Condensor Lenses 2[3]
Current Stability
Stigmator
Aperture
Condensor Alignment
Lens Type
Stage
Stage Type
Specimen Loading Pull out Stage
Sample Holder Type
X, Y Travel Range 25 mm[3]
Z Travel Range 25mm [3]
Tilt Range
Rotation Range 360°[3]
Drive Mechanism Knob (manual)
Objective Lens
Working Distance
Spherical Error
Current Stability
Stigmator dual quadropole[3]
Deflection Type double electromagnetic
Point Resolution 5 nm[3], 4 nm poossible[3]
Lens Type Electromagnetic


DSM-940
Zeiss - DSM-940 - from Manual.png
General
Year
Successor DSM 940A
Magnification Range 15 x - 200 kx[4]
Magnification Gauge Type CRT legend[4]
Specemin Chamber Pressure
Power Consumption
System Weight
Electrion Source
Accelerator Type Self Biased Triode Gun
Cathode Type Tungsten Hairpin
Accelerating Voltage 1, 2, 3, 4, 5, 10, 15, 20, 30 kV[4]
Stability
Cathode Heating Methode DC
Alignment Methode Electromagnetic
Condensor
Number of Condensor Lenses 2[4]
Current Stability
Stigmator
Aperture
Condensor Alignment
Lens Type
Stage
Stage Type Eucentric
Specimen Loading Pull out Stage
Sample Holder Type
X, Y Travel Range 25 mm[4]
Z Travel Range 25 mm[4]
Tilt Range -15° to +90°[4]
Rotation Range 360°[4]
Drive Mechanism Knob (manual)
Objective Lens
Working Distance
Spherical Error
Current Stability
Stigmator Double Quadrupole
Deflection Type
Point Resolution 5 nm[4]
Lens Type Electromagnetic


DSM-960
[[File:|200px|link=DSM-960]]
General
Year
Successor DSM-960A
Magnification Range
Magnification Gauge Type CRT legend
Specemin Chamber Pressure
Power Consumption
System Weight
Electrion Source
Accelerator Type Self Biased Triode Gun
Cathode Type Tungsten Hairpin
Accelerating Voltage
Stability
Cathode Heating Methode DC
Alignment Methode Electromagnetic
Condensor
Number of Condensor Lenses 2
Current Stability
Stigmator
Aperture
Condensor Alignment
Lens Type
Stage
Stage Type
Specimen Loading Pull out Stage
Sample Holder Type
X, Y Travel Range
Z Travel Range
Tilt Range
Rotation Range
Drive Mechanism Servo Motor / Knob (manual)
Objective Lens
Working Distance
Spherical Error
Current Stability
Stigmator Double Quadrupole
Deflection Type
Point Resolution
Lens Type Electromagnetic


DSM-940A
Zeiss DSM 940A color.png
General
Year 1991[5]
Successor [[]]
Magnification Range
Magnification Gauge Type CRT legend
Specemin Chamber Pressure
Power Consumption
System Weight
Electrion Source
Accelerator Type Self Biased Triode Gun
Cathode Type Tungsten Hairpin
Accelerating Voltage
Stability
Cathode Heating Methode DC
Alignment Methode Electromagnetic
Condensor
Number of Condensor Lenses 2
Current Stability
Stigmator
Aperture
Condensor Alignment
Lens Type
Stage
Stage Type
Specimen Loading Pull out Stage
Sample Holder Type
X, Y Travel Range 25 mm
Z Travel Range 25mm
Tilt Range
Rotation Range 360°
Drive Mechanism Knob (manual)
Objective Lens
Working Distance
Spherical Error
Current Stability
Stigmator dual quadropole
Deflection Type double electromagnetic
Point Resolution
Lens Type Electromagnetic


DSM-960A
Zeiss DSM 960A.png
General
Year 1991[6]
Successor [[]]
Magnification Range 4 x - 300 kx[6]
Magnification Gauge Type CRT legend[6]
Specemin Chamber Pressure
Power Consumption
System Weight
Electrion Source
Accelerator Type Self Biased Triode Gun
Cathode Type Tungsten Hairpin / LaB₆[6]
Accelerating Voltage 490 v - 5 kV, 5 kV - 30 kV[6]
Stability
Cathode Heating Methode DC
Alignment Methode Electromagnetic
Condensor
Number of Condensor Lenses 2
Current Stability
Stigmator
Aperture
Condensor Alignment
Lens Type
Stage
Stage Type Eucentric
Specimen Loading Pull out Stage
Sample Holder Type
X, Y Travel Range 80 mm[6]
Z Travel Range 30mm[6]
Tilt Range -15° to +90°[6]
Rotation Range 360°[6]
Drive Mechanism Servo Motor / Knob (manual)
Objective Lens
Working Distance
Spherical Error
Current Stability
Stigmator dual quadropole
Deflection Type double electromagnetic
Point Resolution 4 nm (W) / 3.5nm (LaB₆)[6]
Lens Type Electromagnetic


DSM-962
Zeiss DSM 962.png
General
Year
Successor [[]]
Magnification Range
Magnification Gauge Type CRT legend
Specemin Chamber Pressure
Power Consumption
System Weight
Electrion Source
Accelerator Type Self Biased Triode Gun
Cathode Type Tungsten Hairpin / LaB₆
Accelerating Voltage
Stability
Cathode Heating Methode DC
Alignment Methode Electromagnetic
Condensor
Number of Condensor Lenses 2
Current Stability
Stigmator
Aperture
Condensor Alignment
Lens Type
Stage
Stage Type Eucentric
Specimen Loading Pull out Stage
Sample Holder Type
X, Y Travel Range 80 mm
Z Travel Range 30mm
Tilt Range -15° to +90°
Rotation Range 360°
Drive Mechanism Servo Motor / Knob (manual)
Objective Lens
Working Distance
Spherical Error
Current Stability
Stigmator dual quadropole
Deflection Type double electromagnetic
Point Resolution
Lens Type Electromagnetic


DSM-982 GEMINI
Zeiss - DSM-982 GEMINI - from N25D0080.png
General
Year 1993[7]
Successor LEO 982
Magnification Range up to 700 kx[7]
Magnification Gauge Type CRT legend, Plasma Display
Specemin Chamber Pressure
Power Consumption
System Weight
Electrion Source
Accelerator Type
Cathode Type Schottky FEG[7]
Accelerating Voltage 200 v - 30kV[7]
Stability
Cathode Heating Methode DC
Alignment Methode Electromagnetic / Mechanical
Condensor
Number of Condensor Lenses 1[7]
Current Stability
Stigmator
Aperture
Condensor Alignment
Lens Type
Stage
Stage Type Eucentric
Specimen Loading Pull out Stage[7]
Sample Holder Type
X, Y Travel Range 80 mm[7]
Z Travel Range 30mm[7]
Tilt Range -15° to +90°[7]
Rotation Range 360°[7]
Drive Mechanism Servo Motor / Knob (manual)[7]
Objective Lens
Working Distance
Spherical Error
Current Stability
Stigmator dual quadropole
Deflection Type double electromagnetic
Point Resolution 1.2 mn (20kV)[7], 2.5 nm (5kV)[7], 4nm (1kV)[7]
Lens Type Electromagnetic

Special Projects

Project SATEM / PACEM

The SATEM (Sub Ångström Transmission Electron Mictroscope) was a Libra 200 based machine intended to achieve the highest spacial resolution achievable at the time, it featured a Image Side Spherical Aberation Corrector made by Template:CEOS, and like SESAM, it featured a Pendulum Mount. Later the machine was retrofitted to be a Phase Contrast TEM, and was renamed PACEM

Project SESAM

Main Article: Template:Zeiss SESAM

The Zeiss SESAM (SESAM III) as seen in 2020.

Project SESAM (Sub Electronvolt Sub Ångström Mictroscope) was a project running from 1996 to 2007 in which the goal was to create a Energy Filtered Electron Microscope ({Electron Energy Loss Spectroscopy | EF-TEM}) capable of having an energy resolution below 1eV while also having very high spacial resolution. (complete description later)

Three machines where built in the project, of which only 1 survived to the current day. The first being based on the EM922 (SESAM 1) and working based on a Corrected Omega Filter with a LaB6 Electron Gun. The second was the archetype for the later Libra-200 series (SESAM II) and featured the same Corrected Omega Filter as the SESAM 1, but used an Electrostatic Omega Filtered Schottky FEG. The third and final machine was the SESAM (SESAM III) featuring the newly developed MANDOLINE Filter, based on a Libra-200, and also featuring a Electrostatic Omega Filtered Schottky FEG. It also featured a Pendulum mounted column within a large frame. Of the three machines, only the SESAM (SESAM III) survived, and is currently stored at the Museum For Electron Microscopy Nuremburg (Germany), where it will soon go on display, and later be usable again.

SESAM I

SESAM I was based on a EM922, and featured a the first Corrected OMEGA Filter. It originally used a LaB6 electron gun, but was later fitted with a Electrostatic Omega monochromated Shottkey Gun. The machine was lost in a fire.

SESAM II

Archetype of the Libra 200, Originally Located at Max Plank Institute for Solid State Physics in Stuttgart Germany, where it later gave way to the SESAM III, based on anecdotes it was moved to the University Tübingen, where it was ultimately scrapped. Its Electron Gun was fitted to the SESAM I.

SESAM (SESAM III)

Originally Located in the Max Plank Institute for Solid State Physics in Stuttgart Germany, it was installed in 2007 and was in operation until 2024 where it suffered a technical defect, after which it was transferred to the Museum.

Project CRISP

Project CRISP (Corrected Illumination Scanning Probe) was a special Libra 200 based machine built in 2007, and was one of the first energy filtered monochromated abberation corrected STEM in the world, it features a Probe side abberation corrector from Template:CEOS as well as a Electrostatic Omega Filtered Shottkey FEG, and a corrected Omega In column Filter.

Project SALVE

Project SALVE (Sub Ångström Low Voltage Electron Microscope) was aimed at creating a TEM for very low voltages observations of Radiation-Sensitive materials at ultra high resolutions, at the university ULM. The project initially was based on the Libra-200 in cooperation between Zeiss and CEOS. The SALVE I was made as a feasibility study [1] started in January 1st 2009 and lasted until December 31st 2010[1]. Based on the original SALVE I column, SALVE II was built, featuring a new Cc/Cs Corrector from CEOS. In January 2013, Zeiss ceased production and development of TEM's[1] and a new cooperation partner was found in FEI, where the SALVE III was then produced

Project KRONOS

Main Article: Zeiss KRONOS
Project KRONOS is a Phase contrast aberration corrected Cryo EM. (add more text later)

Refrences

  1. ↑ 1.0 1.1 1.2 1.3 {https://www.salve-project.de/about/about_salve/index.html | About SALVE III}
  2. ↑ 2.00 2.01 2.02 2.03 2.04 2.05 2.06 2.07 2.08 2.09 2.10 2.11 Raster-Elektronenmikroskop NOVASCAN 30, Zeiss, 34-420-d
  3. ↑ 3.00 3.01 3.02 3.03 3.04 3.05 3.06 3.07 3.08 3.09 3.10 3.11 3.12 3.13 Digitales Raster-Elektronenmikroskop DSM 950
  4. ↑ 4.0 4.1 4.2 4.3 4.4 4.5 4.6 4.7 4.8 Digitales Rasterelektronenmikroskop DSM 940 Gebrauchsanleitung
  5. ↑ Für Forschung und Routine. Universal Raster-Elektronenmikroskop DSM 940A
  6. ↑ 6.0 6.1 6.2 6.3 6.4 6.5 6.6 6.7 6.8 6.9 Für die Analytik in mikrobereichen. Hochleistungs-Raster-Elektronenmikroskop DSM 960A
  7. ↑ 7.00 7.01 7.02 7.03 7.04 7.05 7.06 7.07 7.08 7.09 7.10 7.11 7.12 7.13 Feldemissions-Raster-Elektronenmikroskop DSM-982 GEMINI, N25D0080


Documentation

Full list of all documents related to the Zeiss Electron Microscopes.

Transmission Electron Microscope

Scanning Electron Microscopes

Miscilanious

stuff

Transmission Electron Microscops
Model Year Accelerating Voltage Cathode Type Nr. of Condensor Lenses Nr. of Imaging Lenses Projective Resolution Successor
EM7 EM8
EM8 Tungsten Hairpin 1 Electrostatic 3 Electrostatic Imersion and EinzelLense EM9
EM9 60 KV Tungsten Hairpin 1 Electromagnetic 3 Electromagnetic Single Polpiece 70 Å [1] [[EM10}]
EM10 20, 40, 60, 80, 100 KV 2 Electromagnetic 3 Electromagnetic Single Polpiece < 30 Å [2] EM900
EM109 50, 80 KV Tungsten Hairpin 2 Electromagnetic 4 Electromagnetic Single Polpiece 50 Å [3]
EM900 Tungsten Hairpin EM902
EM902 Tungsten Hairpin EM912
EM906 Tungsten Hairpin Single Polpiece
EM910 Tungsten Hairpin
EM912 Tungsten Hairpin

Refrences

  1. ↑ Das Elektronenmikroskop TEM+REM, Dr. Rainer Horst Lang, Dr. Jochen Blödorn, 1981, page 131
  2. ↑ Das Elektronenmikroskop TEM+REM, Dr. Rainer Horst Lang, Dr. Jochen Blödorn, 1981, page 132
  3. ↑ Das Elektronenmikroskop TEM+REM, Dr. Rainer Horst Lang, Dr. Jochen Blödorn, 1981, page 133
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