Topcon was a manufacturer of Scanning Electron microscopes located in the USA.
Topcon Logo as seen in 1990's
Scanning Electron Microscopes
| SM-520
|
|
| General
|
| Year
|
|
| Successor
|
[[]]
|
| Magnification Range
|
|
| Magnification Gauge Type
|
Computer screen
|
| Specemin Chamber Pressure
|
|
| Power Consumption
|
|
| System Weight
|
|
|
| Electrion Source
|
| Accelerator Type
|
|
| Cathode Type
|
Shottkey FEG[1]
|
| Accelerating Voltage
|
|
| Stability
|
|
| Cathode Heating Methode
|
|
| Alignment Methode
|
|
|
| Condensor
|
| Number of Condensor Lenses
|
|
| Current Stability
|
|
| Stigmator
|
None
|
| Aperture
|
|
| Condensor Alignment
|
|
| Lens Type
|
Electromagnetic[1]
|
|
| Stage
|
| Stage Type
|
|
| Specimen Loading
|
|
| Sample Holder Type
|
|
| X, Y Travel Range
|
|
| Z Travel Range
|
|
| Tilt Range
|
|
| Rotation Range
|
|
| Drive Mechanism
|
|
|
| Objective Lens
|
| Working Distance
|
|
| Spherical Error
|
|
| Current Stability
|
|
| Stigmator
|
|
| Deflection Type
|
|
| Point Resolution
|
|
| Lens Type
|
Electromagnetic
|
|
| SM-720
|
|
| General
|
| Year
|
|
| Successor
|
[[]]
|
| Magnification Range
|
10x - 800kx (top stage) / 20x-6Mx (Second Stage)[2]
|
| Magnification Gauge Type
|
Computer screen
|
| Specemin Chamber Pressure
|
|
| Power Consumption
|
5.5kVA[2]
|
| System Weight
|
938kg[2]
|
|
| Electrion Source
|
| Accelerator Type
|
|
| Cathode Type
|
Shottkey FEG[2]
|
| Accelerating Voltage
|
500v - 30kV[2]
|
| Stability
|
|
| Cathode Heating Methode
|
DC
|
| Alignment Methode
|
2 Stage Electromagnetic [2]
|
|
| Condensor
|
| Number of Condensor Lenses
|
2[2]
|
| Current Stability
|
|
| Stigmator
|
|
| Aperture
|
|
| Condensor Alignment
|
|
| Lens Type
|
Electromagnetic[2]
|
|
| Stage
|
| Stage Type
|
Dual Stage, Airlock type
|
| Specimen Loading
|
|
| Sample Holder Type
|
|
| X, Y Travel Range
|
6mm (Top Stage) / X: 80mm; Y: 60mm (Second Stage)[2]
|
| Z Travel Range
|
3mm - 60mm (Second Stage)[2]
|
| Tilt Range
|
|
| Rotation Range
|
|
| Drive Mechanism
|
|
|
| Objective Lens
|
| Working Distance
|
|
| Spherical Error
|
|
| Current Stability
|
|
| Stigmator
|
|
| Deflection Type
|
|
| Point Resolution
|
0.9nm (Top Stage 30kV) / 1.5nm (Bottom Stage 30kV); 4nm (Top Stage 1kV) / 10nm (Second Stage 1kV)[2]
|
| Lens Type
|
Electromagnetic
|
|
| Opti-SEM 300
|
|
| General
|
| Year
|
|
| Successor
|
[[]]
|
| Magnification Range
|
20 - 20kx[3]
|
| Magnification Gauge Type
|
Computer screen
|
| Specemin Chamber Pressure
|
|
| Power Consumption
|
2 kVA[3]
|
| System Weight
|
402 kg[3]
|
|
| Electrion Source
|
| Accelerator Type
|
|
| Cathode Type
|
Tungsten Hairpin
|
| Accelerating Voltage
|
0.5 - 3 kV / 5 kV - 30 kV[3]
|
| Stability
|
|
| Cathode Heating Methode
|
DC
|
| Alignment Methode
|
|
|
| Condensor
|
| Number of Condensor Lenses
|
2[3]
|
| Current Stability
|
|
| Stigmator
|
None
|
| Aperture
|
|
| Condensor Alignment
|
|
| Lens Type
|
Electromagnetic[3]
|
|
| Stage
|
| Stage Type
|
|
| Specimen Loading
|
|
| Sample Holder Type
|
|
| X, Y Travel Range
|
X: 80mm / Y: 40mm[3]
|
| Z Travel Range
|
5 - 50mm[3]
|
| Tilt Range
|
-20° +90°[3]
|
| Rotation Range
|
360°[3]
|
| Drive Mechanism
|
|
|
| Objective Lens
|
| Working Distance
|
|
| Spherical Error
|
|
| Current Stability
|
|
| Stigmator
|
Double Quadrupole
|
| Deflection Type
|
|
| Point Resolution
|
4 nm [3]
|
| Lens Type
|
Electromagnetic
|
|
