JEOL - Revision history

Lbochtler: /* Scanning Electron Microscope (SEM) */

2026-03-07T15:54:40Z

Scanning Electron Microscope (SEM)

Lbochtler: added JSM-2, JSM-U3, JSM51

2026-03-07T15:52:57Z

added JSM-2, JSM-U3, JSM51

Lbochtler: /* short list */

2024-11-26T00:32:44Z

short list

Lbochtler: /* SEM */

2024-09-03T01:25:52Z

SEM

Lbochtler: /* Transmission Electron Microscopes */

2024-09-03T01:00:48Z

Transmission Electron Microscopes

192.168.1.137 at 20:47, 20 August 2023

2023-08-20T20:47:08Z

Lbochtler: /* Transmission Electron Microscopes */

2022-02-21T22:36:49Z

Transmission Electron Microscopes

Lbochtler: /* High Voltage Electron Microsocpes */

2022-01-02T18:03:04Z

High Voltage Electron Microsocpes

Lbochtler: /* High Voltage Electron Microsocpes */

2022-01-02T16:27:47Z

High Voltage Electron Microsocpes

Lbochtler at 16:23, 2 January 2022

2022-01-02T16:23:11Z

@@ Line 123: / Line 123: @@
    |Cathode Heating Methode=
    |Alignment Methode=
-   |Number of Condensor Lenses= 2<ref name="J. A. Swift 1970"/>
+   |Number of Condensor Lenses= 1<ref name="J. A. Swift 1970"/>
    |Condensor Current Stability=
    |Condensor Stigmator= None
@@ Line 161: / Line 161: @@
    |Cathode Heating Methode=
    |Alignment Methode=
-   |Number of Condensor Lenses= 2<ref name="J. A. Swift 1970"/>
+   |Number of Condensor Lenses= 1<ref name="J. A. Swift 1970"/>
    |Condensor Current Stability=
    |Condensor Stigmator= None
@@ Line 212: / Line 212: @@
 *JSM-5600: 1997
 [[Category:Electron Microscope]]

@@ Line 67: / Line 67: @@
 == Scanning Electron Microscope (SEM) ==
 *JSM-1: 1966
 *JSM-2: 1967
@@ Line 94: / Line 211: @@
 *JSM-6340F: 1996
 *JSM-5600: 1997
 == Electron Probe Microanalyzer (EPMA) ==

@@ Line 23: / Line 23: @@
 = short list =
-== SEM ==
+The lists below include most but not all microscopes and analytical machines created by JEOL since its founding up until 1999, based on a graphic from that time. More models will be added as new information is made available to the Museum.
-JSM-1: 1966
+== Transmission Electron Microscope (TEM) ==
-JSM-2: 1967
+* JEM-1: 1950
-JSM-U3: 1969
+* JEM-4A: 1952
-JSM-50A: 1970
+* JEM-4B: 1953
-JSM-35: 1973
+* JEM-5G: 1955
-JSFM-30: 1974
+* JEM-T4: 1955
-JSM-T20: 1976
+* JEM-5Y: 1959
-JSM-25: 1977
+* JEM-6A: 1961
-JSM-F7: 1977
+* JEM-6C: 1961
-JSM-1200: 1978
+* JEM-T6: 1961
-JSM-840: 1982
+* JEM-30: 1963
-JSM-T300: 1982
+* JEM-7: 1964
-JSM-8?0: 1984
+* JEM-T7: 1965
-JSM-820: 1986
+* JEM-1000: 1966
-JSM-890: 1987
+* JEM-200: 1967
-JSM-840F: 1988
+* JEM-T80B: 1969
-JSM-5200: 1988
+* JEM-T8: 1971
-JSM-6100: 1989
+* JEM-100B: 1972
-JSM-6400F: 1989
+* JEM-100C: 1973
-JSM-5300: 1989
+* JEM-500D: 1973
-JSM-5400: 1989
+* JEM-100S: 1974
-JSM-6300F: 1990
+* JEM-100CX: 1976
-JSM-6600F: 1990
+* JEM-200CX: 1978
-JSM-5800: 1993
+* JEM-1200EX: 1981
-JSM-6320F: 1994
+* JEM-ARM1000: 1982
-JSM-6340F: 1996
+* JEM-2000EX: 1984
-JSM-5600: 1997
+* JEM-2000FX: 1984
 [[Category:Electron Microscope]]

@@ Line 30: / Line 30: @@
 JSM-35: 1973
 JSFM-30: 1974
-JSM-120: 1976
+JSM-T20: 1976
 JSM-25: 1977
 JSM-F7: 1977

← Older revision		Revision as of 01:00, 3 September 2024
Line 20:		Line 20:


		+
		+
		+	= short list =
		+	== SEM ==
		+	JSM-1: 1966
		+	JSM-2: 1967
		+	JSM-U3: 1969
		+	JSM-50A: 1970
		+	JSM-35: 1973
		+	JSFM-30: 1974
		+	JSM-120: 1976
		+	JSM-25: 1977
		+	JSM-F7: 1977
		+	JSM-1200: 1978
		+	JSM-840: 1982
		+	JSM-T300: 1982
		+	JSM-8?0: 1984
		+	JSM-820: 1986
		+	JSM-890: 1987
		+	JSM-840F: 1988
		+	JSM-5200: 1988
		+	JSM-6100: 1989
		+	JSM-6400F: 1989
		+	JSM-5300: 1989
		+	JSM-5400: 1989
		+	JSM-6300F: 1990
		+	JSM-6600F: 1990
		+	JSM-5800: 1993
		+	JSM-6320F: 1994
		+	JSM-6340F: 1996
		+	JSM-5600: 1997
		+
		+	[[Category:Electron Microscope]]

	= High Voltage Electron Microsocpes =		= High Voltage Electron Microsocpes =

@@ Line 19: / Line 19: @@
 JEM-1000 D/S 1966
-[[Category:Electron Microscope]]
 = High Voltage Electron Microsocpes =
-{{Tem list entry|Microscope Name=JEM-4000FX (AHP40S)|Microscope Picture File=JEOL-JEM4000FX-system.jpg|Year=|Successor=JEM-4100|Magnification Range=60x-3Kx, 5Kx - 1.2Mx|Magnification Gauge Type=Digital|Specemin Chamber Pressure=|Power Consumption=20 KVA|System Weught=4300 Kg (Console), 500 Kg (Powersupply)|Accelerator Type=	14 stage Electrostatic LINAC|Cathode Type=LaB6|Acceleration Voltage=200 KV, 250 KV 300 KV, 350 KV, 400 KV, 100V Steps|Stability=2e-6/min|Cathode Heating Methode=DC|Alignment Methode=Electromagnetic|No. of Condensor Lenses=3 (5)|Condensor Stability=|Condensor Stigmator=Octopol|Minimum Spot Size=2µm - 2nm|Condensor Alignment=Electromagnetic|Condensor Lens Type=Electromagnetic|Holder Type=Side Entery rod|Travel Range=8 mm (x), 2 mm (y), 0.5 mm (z)|Obj. Focal Length=3.1 mm|Obj. Adjustment Range=|Obj. Spherical Error=1.8 mm|Obj. Stability=1e-6/min|Obj. Stigmator=Quadropol|Obj. Alignment Aid=|Point Resolution=1.4|Obj. Lens Type=Electromagnetic|No. of Proj. Lenses=5|Proj. Stability=|Proj. Polpiece Config=Single Polpiece|Proj. Mag=|Proj. Alignment=Mechanical, Electromagnetic|Proj. Lens Type=Electromagnetic}}
+{{Tem list entry|Microscope Name=JEM-4000FX (AHP40S)|Microscope Picture File=JEOL-JEM4000FX-system.jpg|Year=1986|Successor=JEM-4100|Magnification Range=60x-3Kx, 5Kx - 1.2Mx|Magnification Gauge Type=Digital|Specemin Chamber Pressure=|Power Consumption=20 KVA|System Weught=4300 Kg (Console), 500 Kg (Powersupply)|Accelerator Type=	14 stage Electrostatic LINAC|Cathode Type=LaB6|Acceleration Voltage=200 KV, 250 KV 300 KV, 350 KV, 400 KV, 100V Steps|Stability=2e-6/min|Cathode Heating Methode=DC|Alignment Methode=Electromagnetic|No. of Condensor Lenses=3 (5)|Condensor Stability=|Condensor Stigmator=Octopol|Minimum Spot Size=2µm - 2nm|Condensor Alignment=Electromagnetic|Condensor Lens Type=Electromagnetic|Holder Type=Side Entery rod|Travel Range=8 mm (x), 2 mm (y), 0.5 mm (z)|Obj. Focal Length=3.1 mm|Obj. Adjustment Range=|Obj. Spherical Error=1.8 mm|Obj. Stability=1e-6/min|Obj. Stigmator=Quadropol|Obj. Alignment Aid=|Point Resolution=1.4|Obj. Lens Type=Electromagnetic|No. of Proj. Lenses=5|Proj. Stability=|Proj. Polpiece Config=Single Polpiece|Proj. Mag=|Proj. Alignment=Mechanical, Electromagnetic|Proj. Lens Type=Electromagnetic}}
-{{Tem list entry|Microscope Name=JEM-4000FX (AHP40L)|Microscope Picture File=JEOL-JEM4000FX-system.jpg|Year=|Successor=JEM-4100|Magnification Range=60x-3Kx, 5Kx - 800Kx|Magnification Gauge Type=Digital|Specemin Chamber Pressure=|Power Consumption=20 KVA|System Weught=4300 Kg (Console), 500 Kg (Powersupply)|Accelerator Type=	14 stage Electrostatic LINAC|Cathode Type=LaB6|Acceleration Voltage=100 Kv, 150 KV,200 KV, 250 KV 300 KV, 350 KV, 400 KV, 100V Steps|Stability=2e-6/min|Cathode Heating Methode=DC|Alignment Methode=Electromagnetic|No. of Condensor Lenses=3 (5)|Condensor Stability=|Condensor Stigmator=Octopol|Minimum Spot Size=2µm - 2nm|Condensor Alignment=Electromagnetic|Condensor Lens Type=Electromagnetic|Holder Type=Side Entery rod|Travel Range=8 mm (x), 2 mm (y), 0.5 mm (z)|Obj. Focal Length=4.4 mm|Obj. Adjustment Range=|Obj. Spherical Error=3.4 mm|Obj. Stability=1e-6/min|Obj. Stigmator=Quadropol|Obj. Alignment Aid=|Point Resolution=1.4|Obj. Lens Type=Electromagnetic|No. of Proj. Lenses=5|Proj. Stability=|Proj. Polpiece Config=Single Polpiece|Proj. Mag=|Proj. Alignment=Mechanical, Electromagnetic|Proj. Lens Type=Electromagnetic}}
+{{Tem list entry|Microscope Name=JEM-4000FX (AHP40L)|Microscope Picture File=JEOL-JEM4000FX-system.jpg|Year=1986|Successor=JEM-4100|Magnification Range=60x-3Kx, 5Kx - 800Kx|Magnification Gauge Type=Digital|Specemin Chamber Pressure=|Power Consumption=20 KVA|System Weught=4300 Kg (Console), 500 Kg (Powersupply)|Accelerator Type=	14 stage Electrostatic LINAC|Cathode Type=LaB6|Acceleration Voltage=100 Kv, 150 KV,200 KV, 250 KV 300 KV, 350 KV, 400 KV, 100V Steps|Stability=2e-6/min|Cathode Heating Methode=DC|Alignment Methode=Electromagnetic|No. of Condensor Lenses=3 (5)|Condensor Stability=|Condensor Stigmator=Octopol|Minimum Spot Size=2µm - 2nm|Condensor Alignment=Electromagnetic|Condensor Lens Type=Electromagnetic|Holder Type=Side Entery rod|Travel Range=8 mm (x), 2 mm (y), 0.5 mm (z)|Obj. Focal Length=4.4 mm|Obj. Adjustment Range=|Obj. Spherical Error=3.4 mm|Obj. Stability=1e-6/min|Obj. Stigmator=Quadropol|Obj. Alignment Aid=|Point Resolution=1.4|Obj. Lens Type=Electromagnetic|No. of Proj. Lenses=5|Proj. Stability=|Proj. Polpiece Config=Single Polpiece|Proj. Mag=|Proj. Alignment=Mechanical, Electromagnetic|Proj. Lens Type=Electromagnetic}}
 [[Category:Electron Microscope]]

← Older revision		Revision as of 22:36, 21 February 2022
Line 15:		Line 15:

	{{Tem list entry\|Microscope Name=JEM-100C\|Microscope Picture File=\|Year=\|Successor=\|Magnification Range=90, 250, 500, 750x, 1050x - 800Kx (HR Stage), 660-500Kx (TEG), 330-250Kx (SEG)\|Magnification Gauge Type=Digital\|Specemin Chamber Pressure=\|Power Consumption=4.5 KVA\|System Weught=1655Kg\|Accelerator Type=\|Cathode Type=\|Acceleration Voltage=20, 40, 60, 80, 100, 120 KV\|Stability=\|Cathode Heating Methode=DC\|Alignment Methode=Electromechanical\|No. of Condensor Lenses=2\|Condensor Stability=\|Condensor Stigmator=quadropol\|Minimum Spot Size=\|Condensor Alignment=\|Condensor Lens Type=\|Holder Type=Top Entery Cartridge\|Travel Range=\|Obj. Focal Length=1.6mm (HR), 3.1 mm (TEG), 5 mm (SEG)\|Obj. Adjustment Range=\|Obj. Spherical Error=\|Obj. Stability=\|Obj. Stigmator=\|Obj. Alignment Aid=Wobbler\|Point Resolution=1.4\|Obj. Lens Type=Electromagnetic\|No. of Proj. Lenses=3\|Proj. Stability=\|Proj. Polpiece Config=Single Polpiece\|Proj. Mag=\|Proj. Alignment=\|Proj. Lens Type=}}		{{Tem list entry\|Microscope Name=JEM-100C\|Microscope Picture File=\|Year=\|Successor=\|Magnification Range=90, 250, 500, 750x, 1050x - 800Kx (HR Stage), 660-500Kx (TEG), 330-250Kx (SEG)\|Magnification Gauge Type=Digital\|Specemin Chamber Pressure=\|Power Consumption=4.5 KVA\|System Weught=1655Kg\|Accelerator Type=\|Cathode Type=\|Acceleration Voltage=20, 40, 60, 80, 100, 120 KV\|Stability=\|Cathode Heating Methode=DC\|Alignment Methode=Electromechanical\|No. of Condensor Lenses=2\|Condensor Stability=\|Condensor Stigmator=quadropol\|Minimum Spot Size=\|Condensor Alignment=\|Condensor Lens Type=\|Holder Type=Top Entery Cartridge\|Travel Range=\|Obj. Focal Length=1.6mm (HR), 3.1 mm (TEG), 5 mm (SEG)\|Obj. Adjustment Range=\|Obj. Spherical Error=\|Obj. Stability=\|Obj. Stigmator=\|Obj. Alignment Aid=Wobbler\|Point Resolution=1.4\|Obj. Lens Type=Electromagnetic\|No. of Proj. Lenses=3\|Proj. Stability=\|Proj. Polpiece Config=Single Polpiece\|Proj. Mag=\|Proj. Alignment=\|Proj. Lens Type=}}
		+
		+	JEM-7 : 1968
		+	JEM-1000 D/S 1966
		+
		+	[[Category:Electron Microscope]]

	= High Voltage Electron Microsocpes =		= High Voltage Electron Microsocpes =

@@ Line 17: / Line 17: @@
 = High Voltage Electron Microsocpes =
-{{Tem list entry|Microscope Name=JEM-4000FX (AHP40S)|Microscope Picture File=JEOL-JEM4000FX-system.jpg|Year=|Successor=JEM-4100|Magnification Range=60x-3Kx, 5Kx - 1.2Mx|Magnification Gauge Type=Digital|Specemin Chamber Pressure=|Power Consumption=20 KVA|System Weught=4300 Kg (Console), 500 Kg (Powersupply)|Accelerator Type=Multistage electrostatic Linear Accelerator|Cathode Type=LaB6|Acceleration Voltage=200 KV, 250 KV 300 KV, 350 KV, 400 KV, 100V Steps|Stability=2e-6/min|Cathode Heating Methode=DC|Alignment Methode=Electromagnetic|No. of Condensor Lenses=|Condensor Stability=|Condensor Stigmator=Octopol|Minimum Spot Size=2µm - 2nm|Condensor Alignment=Electromagnetic|Condensor Lens Type=|Holder Type=Side Entery rod|Travel Range=8 mm (x), 2 mm (y), 0.5 mm (z)|Obj. Focal Length=3.1 mm|Obj. Adjustment Range=|Obj. Spherical Error=1.8 mm|Obj. Stability=1e-6/min|Obj. Stigmator=Quadropol|Obj. Alignment Aid=|Point Resolution=1.4|Obj. Lens Type=Electromagnetic|No. of Proj. Lenses=|Proj. Stability=|Proj. Polpiece Config=Single Polpiece|Proj. Mag=|Proj. Alignment=Mechanical, Electromagnetic|Proj. Lens Type=}}
+{{Tem list entry|Microscope Name=JEM-4000FX (AHP40S)|Microscope Picture File=JEOL-JEM4000FX-system.jpg|Year=|Successor=JEM-4100|Magnification Range=60x-3Kx, 5Kx - 1.2Mx|Magnification Gauge Type=Digital|Specemin Chamber Pressure=|Power Consumption=20 KVA|System Weught=4300 Kg (Console), 500 Kg (Powersupply)|Accelerator Type=Multistage electrostatic Linear Accelerator|Cathode Type=LaB6|Acceleration Voltage=200 KV, 250 KV 300 KV, 350 KV, 400 KV, 100V Steps|Stability=2e-6/min|Cathode Heating Methode=DC|Alignment Methode=Electromagnetic|No. of Condensor Lenses=3 (5)|Condensor Stability=|Condensor Stigmator=Octopol|Minimum Spot Size=2µm - 2nm|Condensor Alignment=Electromagnetic|Condensor Lens Type=Electromagnetic|Holder Type=Side Entery rod|Travel Range=8 mm (x), 2 mm (y), 0.5 mm (z)|Obj. Focal Length=3.1 mm|Obj. Adjustment Range=|Obj. Spherical Error=1.8 mm|Obj. Stability=1e-6/min|Obj. Stigmator=Quadropol|Obj. Alignment Aid=|Point Resolution=1.4|Obj. Lens Type=Electromagnetic|No. of Proj. Lenses=5|Proj. Stability=|Proj. Polpiece Config=Single Polpiece|Proj. Mag=|Proj. Alignment=Mechanical, Electromagnetic|Proj. Lens Type=Electromagnetic}}
-{{Tem list entry|Microscope Name=JEM-4000FX (AHP40L)|Microscope Picture File=JEOL-JEM4000FX-system.jpg|Year=|Successor=JEM-4100|Magnification Range=60x-3Kx, 5Kx - 800Kx|Magnification Gauge Type=Digital|Specemin Chamber Pressure=|Power Consumption=20 KVA|System Weught=4300 Kg (Console), 500 Kg (Powersupply)|Accelerator Type=Multistage electrostatic Linear Accelerator|Cathode Type=LaB6|Acceleration Voltage=100 Kv, 150 KV,200 KV, 250 KV 300 KV, 350 KV, 400 KV, 100V Steps|Stability=2e-6/min|Cathode Heating Methode=DC|Alignment Methode=Electromagnetic|No. of Condensor Lenses=|Condensor Stability=|Condensor Stigmator=Octopol|Minimum Spot Size=2µm - 2nm|Condensor Alignment=Electromagnetic|Condensor Lens Type=|Holder Type=Side Entery rod|Travel Range=8 mm (x), 2 mm (y), 0.5 mm (z)|Obj. Focal Length=4.4 mm|Obj. Adjustment Range=|Obj. Spherical Error=3.4 mm|Obj. Stability=1e-6/min|Obj. Stigmator=Quadropol|Obj. Alignment Aid=|Point Resolution=1.4|Obj. Lens Type=Electromagnetic|No. of Proj. Lenses=|Proj. Stability=|Proj. Polpiece Config=Single Polpiece|Proj. Mag=|Proj. Alignment=Mechanical, Electromagnetic|Proj. Lens Type=}}
+{{Tem list entry|Microscope Name=JEM-4000FX (AHP40L)|Microscope Picture File=JEOL-JEM4000FX-system.jpg|Year=|Successor=JEM-4100|Magnification Range=60x-3Kx, 5Kx - 800Kx|Magnification Gauge Type=Digital|Specemin Chamber Pressure=|Power Consumption=20 KVA|System Weught=4300 Kg (Console), 500 Kg (Powersupply)|Accelerator Type=Multistage electrostatic Linear Accelerator|Cathode Type=LaB6|Acceleration Voltage=100 Kv, 150 KV,200 KV, 250 KV 300 KV, 350 KV, 400 KV, 100V Steps|Stability=2e-6/min|Cathode Heating Methode=DC|Alignment Methode=Electromagnetic|No. of Condensor Lenses=3 (5)|Condensor Stability=|Condensor Stigmator=Octopol|Minimum Spot Size=2µm - 2nm|Condensor Alignment=Electromagnetic|Condensor Lens Type=Electromagnetic|Holder Type=Side Entery rod|Travel Range=8 mm (x), 2 mm (y), 0.5 mm (z)|Obj. Focal Length=4.4 mm|Obj. Adjustment Range=|Obj. Spherical Error=3.4 mm|Obj. Stability=1e-6/min|Obj. Stigmator=Quadropol|Obj. Alignment Aid=|Point Resolution=1.4|Obj. Lens Type=Electromagnetic|No. of Proj. Lenses=5|Proj. Stability=|Proj. Polpiece Config=Single Polpiece|Proj. Mag=|Proj. Alignment=Mechanical, Electromagnetic|Proj. Lens Type=Electromagnetic}}
 [[Category:Electron Microscope]]

← Older revision		Revision as of 16:23, 2 January 2022
Line 15:		Line 15:

	{{Tem list entry\|Microscope Name=JEM-100C\|Microscope Picture File=\|Year=\|Successor=\|Magnification Range=90, 250, 500, 750x, 1050x - 800Kx (HR Stage), 660-500Kx (TEG), 330-250Kx (SEG)\|Magnification Gauge Type=Digital\|Specemin Chamber Pressure=\|Power Consumption=4.5 KVA\|System Weught=1655Kg\|Accelerator Type=\|Cathode Type=\|Acceleration Voltage=20, 40, 60, 80, 100, 120 KV\|Stability=\|Cathode Heating Methode=DC\|Alignment Methode=Electromechanical\|No. of Condensor Lenses=2\|Condensor Stability=\|Condensor Stigmator=quadropol\|Minimum Spot Size=\|Condensor Alignment=\|Condensor Lens Type=\|Holder Type=Top Entery Cartridge\|Travel Range=\|Obj. Focal Length=1.6mm (HR), 3.1 mm (TEG), 5 mm (SEG)\|Obj. Adjustment Range=\|Obj. Spherical Error=\|Obj. Stability=\|Obj. Stigmator=\|Obj. Alignment Aid=Wobbler\|Point Resolution=1.4\|Obj. Lens Type=Electromagnetic\|No. of Proj. Lenses=3\|Proj. Stability=\|Proj. Polpiece Config=Single Polpiece\|Proj. Mag=\|Proj. Alignment=\|Proj. Lens Type=}}		{{Tem list entry\|Microscope Name=JEM-100C\|Microscope Picture File=\|Year=\|Successor=\|Magnification Range=90, 250, 500, 750x, 1050x - 800Kx (HR Stage), 660-500Kx (TEG), 330-250Kx (SEG)\|Magnification Gauge Type=Digital\|Specemin Chamber Pressure=\|Power Consumption=4.5 KVA\|System Weught=1655Kg\|Accelerator Type=\|Cathode Type=\|Acceleration Voltage=20, 40, 60, 80, 100, 120 KV\|Stability=\|Cathode Heating Methode=DC\|Alignment Methode=Electromechanical\|No. of Condensor Lenses=2\|Condensor Stability=\|Condensor Stigmator=quadropol\|Minimum Spot Size=\|Condensor Alignment=\|Condensor Lens Type=\|Holder Type=Top Entery Cartridge\|Travel Range=\|Obj. Focal Length=1.6mm (HR), 3.1 mm (TEG), 5 mm (SEG)\|Obj. Adjustment Range=\|Obj. Spherical Error=\|Obj. Stability=\|Obj. Stigmator=\|Obj. Alignment Aid=Wobbler\|Point Resolution=1.4\|Obj. Lens Type=Electromagnetic\|No. of Proj. Lenses=3\|Proj. Stability=\|Proj. Polpiece Config=Single Polpiece\|Proj. Mag=\|Proj. Alignment=\|Proj. Lens Type=}}
		+
		+	= High Voltage Electron Microsocpes =
		+	{{Tem list entry\|Microscope Name=JEM-4000FX (AHP40S)\|Microscope Picture File=JEOL-JEM4000FX-system.jpg\|Year=\|Successor=JEM-4100\|Magnification Range=60x-3Kx, 5Kx - 1.2Mx\|Magnification Gauge Type=Digital\|Specemin Chamber Pressure=\|Power Consumption=20 KVA\|System Weught=4300 Kg (Console), 500 Kg (Powersupply)\|Accelerator Type=Multistage electrostatic Linear Accelerator\|Cathode Type=LaB6\|Acceleration Voltage=200 KV, 250 KV 300 KV, 350 KV, 400 KV, 100V Steps\|Stability=2e-6/min\|Cathode Heating Methode=DC\|Alignment Methode=Electromagnetic\|No. of Condensor Lenses=\|Condensor Stability=\|Condensor Stigmator=Octopol\|Minimum Spot Size=2µm - 2nm\|Condensor Alignment=Electromagnetic\|Condensor Lens Type=\|Holder Type=Side Entery rod\|Travel Range=8 mm (x), 2 mm (y), 0.5 mm (z)\|Obj. Focal Length=3.1 mm\|Obj. Adjustment Range=\|Obj. Spherical Error=1.8 mm\|Obj. Stability=1e-6/min\|Obj. Stigmator=Quadropol\|Obj. Alignment Aid=\|Point Resolution=1.4\|Obj. Lens Type=Electromagnetic\|No. of Proj. Lenses=\|Proj. Stability=\|Proj. Polpiece Config=Single Polpiece\|Proj. Mag=\|Proj. Alignment=Mechanical, Electromagnetic\|Proj. Lens Type=}}
		+
		+	{{Tem list entry\|Microscope Name=JEM-4000FX (AHP40L)\|Microscope Picture File=JEOL-JEM4000FX-system.jpg\|Year=\|Successor=JEM-4100\|Magnification Range=60x-3Kx, 5Kx - 800Kx\|Magnification Gauge Type=Digital\|Specemin Chamber Pressure=\|Power Consumption=20 KVA\|System Weught=4300 Kg (Console), 500 Kg (Powersupply)\|Accelerator Type=Multistage electrostatic Linear Accelerator\|Cathode Type=LaB6\|Acceleration Voltage=100 Kv, 150 KV,200 KV, 250 KV 300 KV, 350 KV, 400 KV, 100V Steps\|Stability=2e-6/min\|Cathode Heating Methode=DC\|Alignment Methode=Electromagnetic\|No. of Condensor Lenses=\|Condensor Stability=\|Condensor Stigmator=Octopol\|Minimum Spot Size=2µm - 2nm\|Condensor Alignment=Electromagnetic\|Condensor Lens Type=\|Holder Type=Side Entery rod\|Travel Range=8 mm (x), 2 mm (y), 0.5 mm (z)\|Obj. Focal Length=4.4 mm\|Obj. Adjustment Range=\|Obj. Spherical Error=3.4 mm\|Obj. Stability=1e-6/min\|Obj. Stigmator=Quadropol\|Obj. Alignment Aid=\|Point Resolution=1.4\|Obj. Lens Type=Electromagnetic\|No. of Proj. Lenses=\|Proj. Stability=\|Proj. Polpiece Config=Single Polpiece\|Proj. Mag=\|Proj. Alignment=Mechanical, Electromagnetic\|Proj. Lens Type=}}

	[[Category:Electron Microscope]]		[[Category:Electron Microscope]]