Changes

JEM-1000 D/S 1966

JEM-1000 D/S 1966

 

= High Voltage Electron Microsocpes =

= High Voltage Electron Microsocpes =

{{Tem list entry|Microscope Name=JEM-4000FX (AHP40S)|Microscope Picture File=JEOL-JEM4000FX-system.jpg|Year=|Successor=JEM-4100|Magnification Range=60x-3Kx, 5Kx - 1.2Mx|Magnification Gauge Type=Digital|Specemin Chamber Pressure=|Power Consumption=20 KVA|System Weught=4300 Kg (Console), 500 Kg (Powersupply)|Accelerator Type= 14 stage Electrostatic LINAC|Cathode Type=LaB6|Acceleration Voltage=200 KV, 250 KV 300 KV, 350 KV, 400 KV, 100V Steps|Stability=2e-6/min|Cathode Heating Methode=DC|Alignment Methode=Electromagnetic|No. of Condensor Lenses=3 (5)|Condensor Stability=|Condensor Stigmator=Octopol|Minimum Spot Size=2µm - 2nm|Condensor Alignment=Electromagnetic|Condensor Lens Type=Electromagnetic|Holder Type=Side Entery rod|Travel Range=8 mm (x), 2 mm (y), 0.5 mm (z)|Obj. Focal Length=3.1 mm|Obj. Adjustment Range=|Obj. Spherical Error=1.8 mm|Obj. Stability=1e-6/min|Obj. Stigmator=Quadropol|Obj. Alignment Aid=|Point Resolution=1.4|Obj. Lens Type=Electromagnetic|No. of Proj. Lenses=5|Proj. Stability=|Proj. Polpiece Config=Single Polpiece|Proj. Mag=|Proj. Alignment=Mechanical, Electromagnetic|Proj. Lens Type=Electromagnetic}}

{{Tem list entry|Microscope Name=JEM-4000FX (AHP40S)|Microscope Picture File=JEOL-JEM4000FX-system.jpg|Year=1986|Successor=JEM-4100|Magnification Range=60x-3Kx, 5Kx - 1.2Mx|Magnification Gauge Type=Digital|Specemin Chamber Pressure=|Power Consumption=20 KVA|System Weught=4300 Kg (Console), 500 Kg (Powersupply)|Accelerator Type= 14 stage Electrostatic LINAC|Cathode Type=LaB6|Acceleration Voltage=200 KV, 250 KV 300 KV, 350 KV, 400 KV, 100V Steps|Stability=2e-6/min|Cathode Heating Methode=DC|Alignment Methode=Electromagnetic|No. of Condensor Lenses=3 (5)|Condensor Stability=|Condensor Stigmator=Octopol|Minimum Spot Size=2µm - 2nm|Condensor Alignment=Electromagnetic|Condensor Lens Type=Electromagnetic|Holder Type=Side Entery rod|Travel Range=8 mm (x), 2 mm (y), 0.5 mm (z)|Obj. Focal Length=3.1 mm|Obj. Adjustment Range=|Obj. Spherical Error=1.8 mm|Obj. Stability=1e-6/min|Obj. Stigmator=Quadropol|Obj. Alignment Aid=|Point Resolution=1.4|Obj. Lens Type=Electromagnetic|No. of Proj. Lenses=5|Proj. Stability=|Proj. Polpiece Config=Single Polpiece|Proj. Mag=|Proj. Alignment=Mechanical, Electromagnetic|Proj. Lens Type=Electromagnetic}}

{{Tem list entry|Microscope Name=JEM-4000FX (AHP40L)|Microscope Picture File=JEOL-JEM4000FX-system.jpg|Year=|Successor=JEM-4100|Magnification Range=60x-3Kx, 5Kx - 800Kx|Magnification Gauge Type=Digital|Specemin Chamber Pressure=|Power Consumption=20 KVA|System Weught=4300 Kg (Console), 500 Kg (Powersupply)|Accelerator Type= 14 stage Electrostatic LINAC|Cathode Type=LaB6|Acceleration Voltage=100 Kv, 150 KV,200 KV, 250 KV 300 KV, 350 KV, 400 KV, 100V Steps|Stability=2e-6/min|Cathode Heating Methode=DC|Alignment Methode=Electromagnetic|No. of Condensor Lenses=3 (5)|Condensor Stability=|Condensor Stigmator=Octopol|Minimum Spot Size=2µm - 2nm|Condensor Alignment=Electromagnetic|Condensor Lens Type=Electromagnetic|Holder Type=Side Entery rod|Travel Range=8 mm (x), 2 mm (y), 0.5 mm (z)|Obj. Focal Length=4.4 mm|Obj. Adjustment Range=|Obj. Spherical Error=3.4 mm|Obj. Stability=1e-6/min|Obj. Stigmator=Quadropol|Obj. Alignment Aid=|Point Resolution=1.4|Obj. Lens Type=Electromagnetic|No. of Proj. Lenses=5|Proj. Stability=|Proj. Polpiece Config=Single Polpiece|Proj. Mag=|Proj. Alignment=Mechanical, Electromagnetic|Proj. Lens Type=Electromagnetic}}

{{Tem list entry|Microscope Name=JEM-4000FX (AHP40L)|Microscope Picture File=JEOL-JEM4000FX-system.jpg|Year=1986|Successor=JEM-4100|Magnification Range=60x-3Kx, 5Kx - 800Kx|Magnification Gauge Type=Digital|Specemin Chamber Pressure=|Power Consumption=20 KVA|System Weught=4300 Kg (Console), 500 Kg (Powersupply)|Accelerator Type= 14 stage Electrostatic LINAC|Cathode Type=LaB6|Acceleration Voltage=100 Kv, 150 KV,200 KV, 250 KV 300 KV, 350 KV, 400 KV, 100V Steps|Stability=2e-6/min|Cathode Heating Methode=DC|Alignment Methode=Electromagnetic|No. of Condensor Lenses=3 (5)|Condensor Stability=|Condensor Stigmator=Octopol|Minimum Spot Size=2µm - 2nm|Condensor Alignment=Electromagnetic|Condensor Lens Type=Electromagnetic|Holder Type=Side Entery rod|Travel Range=8 mm (x), 2 mm (y), 0.5 mm (z)|Obj. Focal Length=4.4 mm|Obj. Adjustment Range=|Obj. Spherical Error=3.4 mm|Obj. Stability=1e-6/min|Obj. Stigmator=Quadropol|Obj. Alignment Aid=|Point Resolution=1.4|Obj. Lens Type=Electromagnetic|No. of Proj. Lenses=5|Proj. Stability=|Proj. Polpiece Config=Single Polpiece|Proj. Mag=|Proj. Alignment=Mechanical, Electromagnetic|Proj. Lens Type=Electromagnetic}}

[[Category:Electron Microscope]]

[[Category:Electron Microscope]]